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39 results about "Surface trap" patented technology

Methods to shape the electric field in electron devices, passivate dislocations and point defects, and enhance the luminescence efficiency of optical devices

A fluorine treatment that can shape the electric field profile in electronic devices in 1, 2, or 3 dimensions is disclosed. A method to increase the breakdown voltage of AlGaN / GaN high electron mobility transistors, by the introduction of a controlled amount of dispersion into the device, is also disclosed. This dispersion is large enough to reduce the peak electric field in the channel, but low enough in order not to cause a significant decrease in the output power of the device. In this design, the whole transistor is passivated against dispersion with the exception of a small region 50 to 100 nm wide right next to the drain side of the gate. In that region, surface traps cause limited amounts of dispersion, that will spread the high electric field under the gate edge, therefore increasing the breakdown voltage. Three different methods to introduce dispersion in the 50 nm closest to the gate are described: (1) introduction of a small gap between the passivation and the gate metal, (2) gradually reducing the thickness of the passivation, and (3) gradually reducing the thickness of the AlGaN cap layer in the region close the gate.
Owner:RGT UNIV OF CALIFORNIA

Method of increasing vacuum surface flashover voltage of insulating dielectric material and modified insulating dielectric material

The invention discloses a method of increasing a vacuum surface flashover voltage of an insulating dielectric material and a modified insulating dielectric material. The method comprises the steps of modifying the surface of a solid insulating dielectric material by adopting ozone, to be specific, putting the to-be-processed solid insulating dielectric material in a sealed cavity, vacuumizing the sealed cavity and then inletting ozone for ozone treatment to obtain the modified insulating dielectric material. The surface conductivity, the surface trap level and the trap density of the insulating dielectric material after the ozone treatment are changed; the surface conductivity is increased obviously, the surface trap level is reduced and the trap density is increased. The method can obviously increase the vacuum alternating current surface flashover voltage of the solid insulating dielectric material; and the method is simple and convenient to operate, has low complexity of the implementation process, relatively good repeatability and strong environmental friendliness, and can be widely applied to the surface treatment of the solid insulating dielectric material in the technical field of high-voltage insulation.
Owner:PINGGAO GRP +2

Metal-semiconductor field effect transistor and production method thereof

The invention discloses a metal-semiconductor field effect transistor formed in silicon carbide, mainly solving the problem of surface trap formed on the surface when making a component. The transistor comprises a semi-insulating silicon carbide substrate (1), a p-type silicon carbide buffer layer (2), a n-type silicon carbide conducting channel layer (3), a n+ capping layer (5), a source electrode (7) and a drain electrode (8), wherein a n-type silicon carbide buffer layer (4) is arranged between the n-type silicon carbide conducting channel layer (3) and the n+ capping layer (5); and a grid electrode (6) are buried inside the buffer layer to form a buried-channel and buried-grid structure. The process of making the component comprises the following steps of: epitaxially growing the p-type silicon carbide buffer layer, the n-type silicon carbide channel layer, the n-type silicon carbide buffer layer and n+ capping layer in sequence; etching grid recession windows on the n+ capping layer and carrying out sacrificial oxidation; and forming the source electrode, the drain electrode and the grid electrode by evaporating metal and peeling. The metal-semiconductor field effect transistor can be used for the manufacturing of high-frequency and high-power integrated circuits.
Owner:XIDIAN UNIV

Dielectric medium trap state measuring and imaging system and method driven by friction nanometer generator

PendingCN113281380ADetection and improvement of micro-nano surface characteristicsWith 2D imagingMaterial analysis by electric/magnetic meansFriction generatorsDielectricNanogenerator
The invention relates to a dielectric medium trap state measuring and imaging system and method driven by a friction nanometer generator, and belongs to the technical field of dielectric media. The system comprises a trap excitation power supply device and a test sample chamber, the trap excitation power supply device comprises an independent layer rotary friction nano generator and a rotary motor, and can output constant charge and high voltage, excite micro-power dielectric barrier uniform discharge on the surface of a dielectric medium, so that electrons are fully sunken and desunken, and desunken current pulses with enough strength and stability are generated; a test sample chamber is used for fixing the dielectric film to be tested and providing controllable filling gas; a test electrode structure is detachable, and electrode groups with different measurement modes can be replaced; and the air gap distance between the upper and lower electrodes can be adjusted. The system has the advantages of being lossless, accurate and capable of achieving two-dimensional imaging, detailed information of trap state distribution on the surface of the high polymer thin film material is further obtained, and detection and improvement of various properties such as insulation, energy storage and micro-nano surface characteristics of the functional material are facilitated.
Owner:CHONGQING UNIV

High-field surface trap evaluation system

The embodiment of the invention discloses a high-field surface trap evaluation system. The system comprises an upper electrode plate, a lower electrode plate, a temperature control cavity, an electrode circuit, a temperature probe and a temperature detection device; the upper electrode plate and the lower electrode plate are oppositely arranged in the temperature control cavity, and the space between the upper electrode plate and the lower electrode plate is used for placing samples; a temperature control device is arranged inside the temperature control cavity; the electrode circuit comprises a power supply, a first switch, a second switch and an ammeter; one end of the power supply is connected with one end of the first switch, and the other end of the first switch is connected with the upper electrode plate; the other end of the power supply is connected with the lower electrode plate and one end of the ammeter separately; one end of the second switch is connected with the other end of the ammeter, and the other end of the second switch is connected with the other end of the first switch; the temperature probe is connected with the temperature detection device and located in the temperature control cavity. According to the high-field surface trap evaluation system, the variation rules of the trap characteristics of the samples in a high field can be learned to study the trap characteristics of dielectric materials in the high filed.
Owner:YUNNAN POWER GRID CO LTD ELECTRIC POWER RES INST

Method and device for improving surface mobility of silicon carbide lateral double-diffusion field effect transistor

ActiveCN112951923AThe breakdown voltage does not dropReduce areaDiodeField-effect transistorPolysilicon gate
The invention discloses a method and device for improving the surface mobility of a silicon carbide lateral double-diffusion field effect transistor. The method comprises the steps: introducing a voltage bias tube, enabling the surface electron concentration of a drift region to be increased when a silicon carbide LDMOS is in forward conduction, enabling the probability that a single electron is captured by a surface trap of an oxide layer above the drift region to be reduced, and enabling the electron mobility to be improved. The device comprises a P-type substrate, which is provided with a P-type isolation layer which divides the device into an LDMOS and a voltage bias tube, the LDMOS comprises a first N-type drift region, a first source region, a first drain region, a gate oxide layer and a polysilicon gate, and is characterized in that four polysilicon field plates which are separated from one another are arranged on the gate oxide layer, the voltage bias tube comprises a second N-type drift region, a second source region and a second drain region, four N+ injection layers are arranged in the second N-type drift region, the polysilicon gate is connected with the second source region, the first drain region is connected with the second drain region, and the four polysilicon field plates are respectively connected with the four N+ injection layers.
Owner:SOUTHEAST UNIV

Nano coating for inhibiting surface charge accumulation of epoxy resin and preparation method

The invention discloses a nano coating for inhibiting surface charge accumulation of epoxy resin and a preparation method. The preparation method comprises the following steps that S1, MMT is weighedand dispersed in deionized water to form a suspension with a mass concentration of 1wt%; S2, PVA and deionized water are added to the suspension prepared in step S1 to enable the PVA mass to account for 40wt%-60wt% of the total solid mass of the PVA and the MMT, and the total solid mass fraction in the solution is 1wt%-2wt%; S3, after complete dissolution of the PVA, a cross-linking agent GA is added, and ultrasonic treatment is performed for 15-30 min under the constant temperature to form a PVA/MMT dispersion system; S4, epoxy resin insulators are treated in the plasmas for 4-8 minutes; andS5, the epoxy resin insulators are vertically immersed into the immersion liquid PVA/MMT dispersion system, and a PVA/MMT two-dimensional nano coating is formed. The coating has a special nano-scale layer structure, can reduce the surface trap level of the epoxy resin insulators from 1.02eV to 0.86eV, and facilitates evacuation of charge carriers along the surface of parallel organic silicate crystal sheet layers; and the surface charge accumulation of the insulators can be reduced, so that the direct current flashover voltage is increased by about 20%.
Owner:XI AN JIAOTONG UNIV +1

A kind of solar water surface insect trap lamp

The invention relates to a solar water surface light trap which comprises a water surface positioning bed frame, a solar cell plane and an optical control light trap, wherein the water surface positioning bed frame adopts a frame structure, and a dynamic instrument cabin and frame-shaped floating balls are respectively arranged at the center of the bottom and around the bottom of the frame structure; an anchorage hoist, a drawstring duct and a storage battery are arranged in the dynamic instrument cabin; the solar cell plane is mounted on the top surface of a cell plane platform, and the optical control light trap is mounted in a cover-shaped lamp holder and provided with an optical control switch. The solar cell plane is utilized to absorb solar energy and convert the solar energy into electrical energy, and the optical control light trap is utilized to attract insects to the water surface for feeding fish, so that the fish farming cost is reduced, the quality of fish is improved, moreover, fish farmers can know the growth situation of fish at any time. Therefore, the solar water surface light trap has the advantages of being reasonable in structure and convenient to use and can provide high-quality and pollution-free green aquatic products for people.
Owner:成武县亿昌信息科技有限公司
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