The invention discloses a
gallium nitride power device with a multi-field plate structure. The
gallium nitride power device is sequentially provided with a substrate, a nucleating layer, a buffer layer, a
first insertion layer, a first GaN layer, a second
insertion layer, a second GaN layer, an AlGaN
barrier layer, a
passivation layer, a grid
electrode field plate, a drain
electrode field plate, aprotective layer, a grid
electrode insertion layer, a p-type GaN grid electrode, a grid electrode
metal, a source electrode
metal and a drain electrode
metal from bottom to top, wherein the
passivation layer located on the surface of the AlGaN
barrier layer is in a strip shape arranged at intervals, the grid electrode field plate and the drain electrode field plate respectively cover part of thepassivation layer, and the surfaces of the grid electrode field plate and the drain electrode field plate and the space between the grid electrode field plate and the drain electrode field plate are covered with the protective layer. According to the invention, the
electric field distribution is uniform, the
voltage endurance capability of the device is enhanced, the stability of grid electrode turn-on
voltage and grid electrode
voltage of the device is effectively improved, and the electric leakage of the device under the action of large current is effectively reduced. The preparation methodis completely compatible with a traditional process, and the preparation difficulty is low.