This invention discloses a
nitride epitaxial structure, its preparation method, and its applications. The
nitride epitaxial structure includes a substrate with atomic steps, on which a
nucleation layer with a striped pattern is grown; and on the striped patterned
nucleation layer, a
transition layer, a first
semiconductor layer, and a second
semiconductor layer epitaxial structure are grown. The
nitride epitaxial structure of this invention achieves a high-
crystal-quality GaN epitaxial layer within an ultrathin thickness range. This epitaxial layer possesses the characteristics of ultrathinness and high
crystal quality, which can effectively improve the heat dissipation characteristics,
voltage withstand characteristics, and
trapping effects of device structures. Especially when applied to high-frequency, high-power devices, the improvement in heat dissipation,
voltage withstand, and
trapping effects helps to enhance the power characteristics and
linearity of the device.