Unlock instant, AI-driven research and patent intelligence for your innovation.

Chirp-type fly-eye uniform light unit of deep ultraviolet lithography illuminating system

A lighting system and deep ultraviolet light technology, applied in the field of chirp compound eye homogenizing unit and homogenizing unit, which can solve the problems of system vibration and energy loss, optical path difference, and inability to interfere.

Active Publication Date: 2014-07-16
BEIJING INSTITUTE OF TECHNOLOGYGY
View PDF4 Cites 2 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Its disadvantage is that it is easy to cause vibration and energy loss to the system
The optical delay element introduces an optical path difference for each sub-beam entering the fly-eye microlens array, so that the beams cannot interfere on the mask. more complex structure

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Chirp-type fly-eye uniform light unit of deep ultraviolet lithography illuminating system
  • Chirp-type fly-eye uniform light unit of deep ultraviolet lithography illuminating system
  • Chirp-type fly-eye uniform light unit of deep ultraviolet lithography illuminating system

Examples

Experimental program
Comparison scheme
Effect test

Embodiment

[0064] There is a chirp-type fly-eye microlens array applied to the lithography illumination system of NA0.75, such as Figure 4 As shown, the structural parameters of the microlens are obtained from formulas (6)-(11). The base of the first row of compound eyes 32a adopts a stepped structure, and the side close to the light source adopts an x-cylindrical lens array with the same length as the chirp-type compound eye, and the other side adopts a y-cylindrical lens array; the base of the second row of compound eyes 32b is equal to The structure of the thickness, the pitch of each sub-lens corresponds to the first row of compound eyes, and an x-cylindrical lens array with the same length as the chirp-type compound eye is used on the side close to the light source, and a y-cylindrical lens array is used on the other side. The medium used to arrange the compound eyes is fused quartz, and the specific parameters are shown in Table 1.

[0065] Table 1 Structural parameters of chirp ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention provides a chirp-type fly-eye uniform light unit of a deep ultraviolet lithography illuminating system. The chirp-type fly-eye uniform light unit comprises chirp-type fly-eyes, an aperture diaphragm and a collecting lens, wherein a base of a first row of fly-eyes is in a stepped structure; a base of a second row of fly-eyes is in an equal-thickness structure; sub-lenses on the first row of fly-eyes are positioned on an object space focal plane of sub-lenses on the second row of fly-eyes which correspond to the first row of fly-eyes; the caliber and curvature radius of each sub-lens on the chirp-type fly-eyes are determined based on the limitation condition that the size of an illumination area of light beams passing through each sub-lens on the chirp-type fly-eyes on a mask surface is the same. Interference speckles in the lithography illuminating system can be effectively suppressed under the condition that a rotary dispersing element and an optical delay element are not used, and the deep ultraviolet lithography illuminating system is simplified.

Description

technical field [0001] The invention relates to a uniform light unit used in a deep ultraviolet lithography illumination system, in particular to a chirp type compound eye uniform light unit used in a deep ultraviolet lithography illumination system, and belongs to the technical field of high-resolution lithography. Background technique [0002] Photolithography is a technology for manufacturing semiconductor devices, which uses optical projection to transfer the circuit pattern on the mask plate to the silicon wafer. Photolithography uses ultraviolet (UV), deep ultraviolet (DUV) light sources, and the like. A variety of semiconductor devices can be fabricated using photolithography, such as diodes, transistors, and VLSI. A typical lithography exposure system includes illumination system, mask, projection objective lens and silicon wafer. [0003] The lithography illumination system includes a beam shaping unit and a uniform light unit. The main function of the dodging un...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20G02B27/09
Inventor 李艳秋肖雷魏立冬
Owner BEIJING INSTITUTE OF TECHNOLOGYGY