Fringe-field-switching-type liquid crystal display device, array substrate and manufacturing method of array substrate
A liquid crystal display device and array substrate technology, which is applied to instruments, nonlinear optics, optics, etc., can solve the problems of large load of data line 11, large electric field difference, large power consumption, etc., so as to reduce signal transmission delay, The effect of reducing parasitic capacitance and improving quality
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Embodiment 1
[0020] image 3 It is a schematic structural diagram of an array substrate of an FFS liquid crystal display device according to an embodiment of the present invention. Figure 4 for image 3 Sectional view along section B-B'. combine image 3 and Figure 4 As shown, the array substrate 2 of the fringe field liquid crystal display device includes a plurality of scanning lines 21, a plurality of data lines 22 formed by the first conductive layer, and the data lines 22 and the scanning lines 21 are arranged to cross each other to define a pixel area 23, usually , the first conductive layer may be aluminum (Al), titanium (Ti) or composite materials thereof. A gate insulating layer 211 is disposed on the substrate 20, and a data line 22 is disposed on the gate insulating layer 211. The data line 22 is covered with a first insulating layer 221. The first insulating layer may be made of silicon oxide or silicon nitride. The first common electrode 24 formed by the second conducti...
Embodiment 2
[0028] Figure 6 It is a structural schematic diagram of an FFS liquid crystal display device according to another embodiment of the present invention. Figure 7 for Figure 6 Sectional view along section B-B'. combine Figure 6 and Figure 7 As shown, the array substrate 2 of the fringe field liquid crystal display device of this embodiment includes a plurality of scanning lines 21, a plurality of data lines 22 formed by the first conductive layer, and the data lines 22 and the scanning lines 21 are arranged to cross each other to define pixels The area 23 covers the first insulating layer 221 on the data line 22, the first common electrode 24 formed by the second conductive layer is disposed on the first insulating layer 241, and covers the second insulating layer 241 on the first common electrode 24, The second common electrode 25 and the pixel electrode 26 formed by the third conductive layer are formed on the second insulating layer 241 , and the pixel electrode 26 is...
Embodiment 3
[0034] The manufacturing process of the array substrate of the FFS liquid crystal display device in the above embodiment will be described in detail.
[0035] First, if Figure 8a As shown, a substrate 20 is provided, and the substrate 20 may be a transparent glass substrate, and a gate metal layer (not shown in the figure) is sputtered on the substrate 20 . Aluminum (Al) can be used for the gate metal layer. Copper (Gu), chromium (Gr), molybdenum (Mo) or their composite materials. Patterning the gate metal layer, developing, exposing, and etching the gate metal layer to form gates and scanning lines (not shown in the figure), and covering the gates and scanning lines with a layer of gate insulating layer 211 .
[0036] Next, if Figure 8b As shown, the first conductive layer is sputtered on the gate insulating layer 211 , developed, exposed, and etched to form a plurality of data lines 22 and source and drain electrodes of the thin film transistor (not shown in the figure)...
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