Vacuum refueling horizontal linear evaporation source
An evaporation source and level technology, applied in vacuum evaporation plating, sputtering plating, ion implantation plating, etc., can solve the problem that the evaporation source cannot be replaced or replenished raw materials online, continuous production, evaporation temperature and evaporation The rate is difficult to control and other problems, to achieve the effect of multi-point controllable heating of raw materials, convenient evaporation temperature and evaporation rate, and simple structure
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[0050] In order to make the purpose, content and advantages of the present invention clearer, the specific embodiments of the present invention will be described in further detail below with reference to the accompanying drawings and examples. The following embodiments are only used to illustrate the technical solutions of the present invention more clearly, and cannot be used to limit the protection scope of the present invention.
[0051] Such as Figure 1-6 As shown, the purpose of the present invention is to solve the above-mentioned problems, and propose a vacuum refueling horizontal linear evaporation source, which overcomes the above-mentioned problems.
[0052] The purpose of the present invention is achieved through the following technical solutions: a vacuum refueling horizontal linear evaporation source, including a sublimation bin storage vacuum chamber and its vacuum system, sublimation bin replacement and replenishment system, device control system, and evaporation sou...
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