A kind of manufacturing method of transparent conductive substrate of nanometer metal mesh
A nano-metal grid, transparent and conductive technology, applied in the direction of cable/conductor manufacturing, circuits, electrical components, etc., can solve the problem of high cost of nano-imprinting molds, and achieve low-cost effects
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Embodiment 1
[0029] The flexible substrate selects polyethylene terephthalate (PET) pre-coated with a water-repellent agent.
[0030] The grid pattern involved in this program is attached figure 2 As shown, the line width range is 20 μm, the depth of laser etching is 10 μm, and the line length of the grid pattern is 10 μm.
[0031] Nano silver wire ink, line length 10μm, particle size 45nm, viscosity 50cP, solvent is pure water, wherein the content of nano metal is 1%, water-based binder polyvinyl alcohol, content is 0.2%, surfactant polyethylene glycol Octyl phenyl ether, content 0.01%.
[0032] Apply the prepared coating ink to the substrate by spin coating, slit coating, micro-gravure coating, spray coating, etc., self-leveling for 5 minutes, and then pre-baking in an oven at 80 degrees for 5 minutes to 20 Minutes later, put it into an oven and bake at 100 degrees for 5 minutes to 20 minutes. At this time, a nanometer metal grid conductive layer with low resistance and high transmitt...
Embodiment 2
[0034] For flexible substrates, choose optical glass pre-coated with water-repellent agent.
[0035] The grid pattern involved in this program is attached figure 2 As shown, the line width range is 5 μm, the depth of laser etching is 5 μm, and the line length of the grid pattern is 10 μm.
[0036] Nano silver wire ink, line length 10μm, particle size 45nm, viscosity 50cP, solvent is pure water, wherein the content of nano metal is 1%, water-based binder polyvinyl alcohol, content is 0.2%, surfactant polyethylene glycol Octyl phenyl ether, content 0.01%.
[0037] Apply the prepared coating ink to the substrate by spin coating, slit coating, micro-gravure coating, spray coating, etc., self-leveling for 5 minutes, and then pre-baking in an oven at 80 degrees for 5 minutes to 20 Minutes later, put it into an oven and bake at 100 degrees for 5 minutes to 20 minutes. At this time, a nanometer metal grid conductive layer with low resistance and high transmittance is obtained.
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