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A kind of manufacturing method of transparent conductive substrate of nanometer metal mesh

A nano-metal grid, transparent and conductive technology, applied in the direction of cable/conductor manufacturing, circuits, electrical components, etc., can solve the problem of high cost of nano-imprinting molds, and achieve low-cost effects

Active Publication Date: 2017-01-18
TIANJIN BAOXINGWEI TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the cost of nanoimprinting molds for this technology is very high, and products with different metal grids require different pattern imprinting molds, and can only be applied to flexible substrates, not rigid substrates such as optical glass.

Method used

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  • A kind of manufacturing method of transparent conductive substrate of nanometer metal mesh
  • A kind of manufacturing method of transparent conductive substrate of nanometer metal mesh

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0029] The flexible substrate selects polyethylene terephthalate (PET) pre-coated with a water-repellent agent.

[0030] The grid pattern involved in this program is attached figure 2 As shown, the line width range is 20 μm, the depth of laser etching is 10 μm, and the line length of the grid pattern is 10 μm.

[0031] Nano silver wire ink, line length 10μm, particle size 45nm, viscosity 50cP, solvent is pure water, wherein the content of nano metal is 1%, water-based binder polyvinyl alcohol, content is 0.2%, surfactant polyethylene glycol Octyl phenyl ether, content 0.01%.

[0032] Apply the prepared coating ink to the substrate by spin coating, slit coating, micro-gravure coating, spray coating, etc., self-leveling for 5 minutes, and then pre-baking in an oven at 80 degrees for 5 minutes to 20 Minutes later, put it into an oven and bake at 100 degrees for 5 minutes to 20 minutes. At this time, a nanometer metal grid conductive layer with low resistance and high transmitt...

Embodiment 2

[0034] For flexible substrates, choose optical glass pre-coated with water-repellent agent.

[0035] The grid pattern involved in this program is attached figure 2 As shown, the line width range is 5 μm, the depth of laser etching is 5 μm, and the line length of the grid pattern is 10 μm.

[0036] Nano silver wire ink, line length 10μm, particle size 45nm, viscosity 50cP, solvent is pure water, wherein the content of nano metal is 1%, water-based binder polyvinyl alcohol, content is 0.2%, surfactant polyethylene glycol Octyl phenyl ether, content 0.01%.

[0037] Apply the prepared coating ink to the substrate by spin coating, slit coating, micro-gravure coating, spray coating, etc., self-leveling for 5 minutes, and then pre-baking in an oven at 80 degrees for 5 minutes to 20 Minutes later, put it into an oven and bake at 100 degrees for 5 minutes to 20 minutes. At this time, a nanometer metal grid conductive layer with low resistance and high transmittance is obtained.

[...

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Abstract

The invention relates to a manufacturing method for a nanometal grid transparent conductive substrate. The method is characterized in that manufacturing steps are as follows: (1) coating a water repellent or an oil repellent on a conductive substrate; (2) using a laser device to etch grid patterns on the conductive substrate; (3) coating a nanometal printing ink on the etched conductive substrate in a spin coating, slit-type coating, slightly concave plate coating or spray coating method and waiting until the nanometal printing ink carries out self-leveling on the conductive substrate for 5-30 minutes; (4) pre-baking the coated conductive substrate for 5-20 minutes in a drying oven at 80 degrees and then putting the conductive substrate into the drying oven to bake for 5-20 minutes at 100 degrees until the nanametal printing ink is cured. The manufacturing method does not need coining dies so that a nanometal grid conductive film can be manufactured at a low cost and the method can be applied to a rigid substrate and a flexible substrate.

Description

technical field [0001] The invention relates to a method for manufacturing a transparent conductive substrate, in particular to a method for manufacturing a transparent conductive substrate with a nanometer metal grid. Background technique [0002] At present, transparent conductive thin substrates mainly include metal oxide substrates, carbon nanotubes or graphene substrates. Nano metal substrates, conductive polymer substrates, among which indium tin oxide (ITO) substrates are the most widely used. The main performance indicators of transparent conductive substrates are conductivity and visible light transparency. Most conductive substrates need to balance the performance between the two. Often, high-conductivity substrates have low transmittance, and high-transmittance substrates have low conductivity. Metal oxide substrates, carbon nanotubes or graphene substrates, and conductive polymer substrates often cannot meet the high requirements of both. For example, under the ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01B13/00
Inventor 潘中海
Owner TIANJIN BAOXINGWEI TECH