A kind of w2n-cu hard nanostructured film and preparation method thereof
A nano-structured and hard technology, applied in ion implantation plating, metal material coating process, coating, etc., can solve the problems of multi-layer film anti-oxidation performance and unsatisfactory friction and wear performance.
Active Publication Date: 2016-05-11
JIANGSU UNIV OF SCI & TECH
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Problems solved by technology
[0003] The purpose of the present invention is to overcome the shortcomings of the existing WN series hard nanostructure composite film and multilayer film anti-oxidation performance and friction and wear performance are not ideal, to provide a WN 2 N-Cu hard nanostructured film has high production efficiency, high hardness and excellent friction and wear properties at medium and low temperatures, and can be used as a nanostructured hard film for dry cutting at high speed and wide temperature range
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[0016] The technical scheme of the present invention will be described below in conjunction with preferred embodiments:
[0017] W of the present invention 2 The N-Cu hard film is completed on the JGP-450 high-vacuum multi-target magnetron sputtering equipment, using high-purity W target and Cu target confocal radio frequency reactive sputtering, and deposited on the hard alloy or ceramic substrate. . The magnetron sputtering apparatus has three sputtering targets, which are respectively installed on three water-cooled brackets, and three stainless steel baffles are respectively installed in front of the three targets, and are automatically controlled by a computer. The pure W target (99.99%), the pure Cu target (99.99%) and the pure Cr target (99.9%) were respectively installed on independent radio frequency cathodes, and the target diameter was 75 mm. The surface of hard alloy or ceramic substrate such as high-speed steel is mirror-polished, and the vacuum chamber is fille...
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Abstract
The invention discloses a hard film and a preparation method thereof. The film uses a pure W target, a pure Cu target and a pure Cr target as targets, and deposits the targets on a hard alloy or ceramic matrix by using a double-target confocal radio frequency reaction sputtering method; the molecular formula of the film is W2N-Cu, wherein the content of W is 85-100 at.%, the content of Cu is 0-15 at.%, and the thickness of the film is 1-3 microns. In the deposition, the vacuum degree is superior to 3.0*10-3 Pa; the arc is started with argon; the argon is reaction gas; the flow ratio of the argon to nitrogen is 10: (6-15); and the sputtering pressure is 0.3 Pa. The method is high in production efficiency; the obtained film has high hardness and excellent friction performance, and can be used as a dry-cut hard film with a nanometer structure under high speed and wide temperature range.
Description
technical field [0001] The present invention relates to a kind of coating and preparation method thereof, especially a kind of W 2 The invention discloses an N-Cu hard nanostructure thin film and a preparation method thereof, belonging to the technical field of ceramic coating. Background technique [0002] The development of modern processing technology has put forward higher service requirements for tool coatings such as "high speed and high temperature", "high precision", "high reliability" and "long life". In addition to high hardness and excellent high temperature oxidation resistance, it is even more necessary for the coating to have excellent friction and wear properties in a wide temperature range. However, although the existing tool coatings have high hardness, their friction and wear properties are not ideal, and it is difficult to meet the harsh service conditions such as high-speed, wide-temperature range cutting. Tungsten nitride has attracted the attention of...
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IPC IPC(8): C23C14/40C23C14/06
Inventor 喻利花许俊华赵洪舰
Owner JIANGSU UNIV OF SCI & TECH