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ITO conducting glass and preparation method thereof

A conductive glass and glass technology, applied in the input/output process of electrical digital data processing, instruments, and data processing, etc., can solve the problems of ITO film peeling, affecting product touch function, ITO adhesion, and compactness.

Inactive Publication Date: 2014-11-26
YICHANG NANBO DISPLAY
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] At the same time, the high refractive index materials required for conventional shadow-eliminating ITO products mostly use Nb 2 o 5 , the subsequent processing of ITO will have processes such as lye stripping, alkali addition and ultrasonic cleaning, while Nb 2 o 5 It will react with lye and dissolve, and the adhesion and compactness of ITO will be affected. In severe cases, the ITO film will fall off, which will affect the touch function of the product.

Method used

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  • ITO conducting glass and preparation method thereof
  • ITO conducting glass and preparation method thereof
  • ITO conducting glass and preparation method thereof

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preparation example Construction

[0049] Such as figure 2 The preparation method of above-mentioned ITO conductive glass shown, comprises the steps:

[0050] S10, providing the glass 10, washing and drying.

[0051] The glass 10 can be selected from float glass or other conventional glass in this field.

[0052] S20, sequentially depositing the first high refractive index layer 20, the first low refractive index layer 30, the second high refractive index layer 40, the second low refractive index layer 50 and the ITO layer 60 by magnetron sputtering on the surface of the cleaned glass 10 , to obtain ITO conductive glass.

[0053] The material of the first high refractive index layer 20 is TiO 2 , ZrO 2 or Si 3 N 4 . TiO 2 The refractive index of 2.3, ZrO 2 The refractive index of 2.17, Si 3 N 4 The refractive index is 2.0. Using TiO 2 , ZrO 2 or Si 3 N 4 As the material of the first high refractive index layer 20 , the transmittance of the first high refractive index layer 20 is relatively low....

Embodiment 1

[0071] The float glass is washed and dried.

[0072] The working pressure is 2×10 -3 Under the condition of mbar, on the surface of float glass, the thickness is sequentially deposited as TiO 2 layer, thickness is SiO 2 layer, thickness is TiO2 layer, thickness is SiO 2 layers and thicknesses are The ITO layer, to obtain the required ITO conductive glass.

Embodiment 2

[0074] The float glass is washed and dried.

[0075] The working pressure is 3×10 -3 Under the condition of mbar, on the surface of float glass, the thickness is sequentially deposited as TiO 2 layer, thickness is SiO 2 layer, thickness is TiO 2 layer, thickness is SiO 2 layers and thicknesses are The ITO layer, to obtain the required ITO conductive glass.

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Abstract

The invention discloses a piece of colorless low-resistance ITO conducting glass for medium-and-large-sized capacitive touch screens. The ITO conducting glass comprises a glass body, a first high-refractive-index layer, a first low-refractive-index layer, a second high-refractive-index layer, a second low-refractive-index layer and an ITO layer, wherein the glass body, the first high-refractive-index layer, the first low-refractive-index layer, the second high-refractive-index layer, the second low-refractive-index layer and the ITO layer are stacked in sequence; the first high-refractive-index layer and the second high-refractive-index layer are both made of TiO2 or ZrO2 or Si3N4; the first low-refractive-index layer and the second low-refractive-index layer are both made of SiO2 or MgF2. According to the ITO conducting glass, a film layer structure with the combination of a low refractive index and a high refractive index is adopted to replace a traditional shallow elimination layer, so the ITO conducting glass can achieve shallow elimination when the area resistance is low (ranging from 10 ohms to 30 ohms); the ITO conducting glass also solves the problem that when Nb2O5 is adopted as high-refractive-index materials of traditional shallow elimination glass, the Nb2O5 reacts with alkali liquor in the subsequent processing process; meanwhile, the ITO color of the shallow elimination glass of the structure is light, so the shadow elimination effect is good, and the application requirements for large-sized capacitive touch screens can be met. The invention further discloses a preparation method of the ITO conducting glass.

Description

technical field [0001] The invention relates to a colorless, low-resistance and shadow-eliminating ITO conductive glass used for medium and large-sized capacitive touch screens and a preparation method thereof. Background technique [0002] ITO conductive glass is deposited silicon dioxide (SiO 2 ) and indium tin oxide (commonly known as ITO) film processing. [0003] ITO is a metal compound with good transparent and conductive properties. It has the characteristics of band gap, high light transmittance in the visible spectrum region and low resistivity. ITO conductive glass is widely used in flat panel display devices, solar cells, and special function window coatings. And other optoelectronic devices, it is a transparent conductive electrode material widely used in LCD, PDP, OLED, touch screen and other flat panel display devices. As the key basic material of flat panel display devices, ITO conductive glass has a broader market space with the continuous updating and upgr...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G06F3/044
Inventor 刘玉华方凤军陈立谭伟杜晓峰
Owner YICHANG NANBO DISPLAY
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