Lattice distributing type anode platform columns obtained by electroreduction metal deposition

A distributed, anode technology, applied in electrodes, electrolysis process, electrolysis components, etc., can solve the problems of slow processing speed, unsatisfactory efficiency, complex printing equipment, etc., and achieve the effect of high work efficiency, compact and reasonable structure and layout

Active Publication Date: 2014-12-03
WENZHOU IND SCI RES INST
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Among them, cn201310457824.7's "Electrolytic Etching and Plating Deposition 3D Printer" and cn200810063195.9's "Numerical Control Selected Area Electrochemical Deposition Rapid Prototyping Method and Device", etc., all use electrochemical deposition methods to realize 3D printing of metal parts. These documents Although the disclosed content has overcome the problem that the electroforming technology must rely on the master mold, there is still the problem of low rapid prototyping efficiency,

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  • Lattice distributing type anode platform columns obtained by electroreduction metal deposition
  • Lattice distributing type anode platform columns obtained by electroreduction metal deposition
  • Lattice distributing type anode platform columns obtained by electroreduction metal deposition

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Embodiment Construction

[0023]As shown in the figure, the application equipment related to the embodiment of the present invention, that is, the lattice anode electroreduction metal deposition parts 3D printing equipment includes a computer numerical control system 5, an equipment base 7, an anode numerical control vertical lifting mechanism 4, and an electrodeposition system. The electrodeposition system includes an anode 16, a metal ion solution working tank 12, an electrochemical power supply 151, a circulation pump 6, a filter 8, a cathode 2, and a working substrate 3 that forms a conductive connection during operation. Wherein metal ion solution 121, metal ion solution working tank 12, metal ion solution delivery tank 11, metal ion solution circulating pump 6, pressure delivery pipe 9 and filter 8 are also used as metal ion solution delivery under pressure The device transports the metal ion solution to the anode infusion channels 17 distributed in dot matrix. In addition, it is also possible to...

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Abstract

The invention relates to an anode assembly of a digital control electrochemical deposition fast-forming device. The anode assembly comprises an insoluble anode. The anode assembly is characterized in that a horizontal anode platform surface in a lattice distributing shape in x-axis and y-axis directions is arranged, each lattice position is fixedly provided with an anode, the lattice positions are mutually insulated to form lattice distributing type anode platform columns, and the anodes are all connected in parallel with electrochemical power supplies of the anodes; the anode platform columns are internally provided with lattice distributing anode liquid delivery channels; and an expanding containing cavity is arranged at the periphery of each anode end surface positioned on the anode platform surface, and the expanding containing cavities and the openings of the anode liquid delivery channels are mutually communicated. The anode assembly disclosed by the invention has the greatest advantage that all electrode points can simultaneously work, that is to say, parallel printing is achieved, thereby being especially high in working efficiency and less in energy consumption; and in addition, the anode assembly disclosed by the invention can solve the problem that electric field intermittence is correspondingly generated inevitably on spaced insulating parts positioned among electrodes because the electrodes positioned on the anode platform surface in the distributing shape need to be insulated by being spaced through insulating resin through the arrangement of the expanding containing cavities and the like, and enables the metal electroreduction deposition to be continuously and stably carried out by providing a buffer area for a metal ion solution.

Description

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Claims

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Application Information

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Owner WENZHOU IND SCI RES INST
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