A kind of array substrate and its preparation method, display device

Abstract

The embodiment of the invention provides an array substrate and a preparation method thereof, and a display device, and relates to the technical field of display so that poor size uniformity of a gap between a source electrode and a drain electrode when barrier layers are formed is prevented and the cost of the barrier layers is reduced and a problem of metal loss and signal discontinuity is solved. The array substrate includes a grid metal layer which is on an underlayer substrate and includes a grid electrode and a grid line; a grid insulating layer; an active layer; a source and drain metal layer which includes the source electrode, the drain electrode, and a data line, wherein the source and drain metal layer includes a copper metal layer and / or a copper alloy layer; and a pixel electrode layer which includes a pixel electrode directly contacting the drain electrode, a first pixel electrode reservation pattern directly contacting the source electrode, and a second pixel electrode reservation pattern directly contacting the data line, wherein an area of the pixel electrode, directly contacting the drain electrode, and the first pixel electrode reservation pattern are located between the active layer and the source and drain metal layer, and an area of the pixel electrode, not directly contacting the drain electrode, and the second pixel electrode reservation pattern are located on / beneath the grid insulating layer. The preparation method is used for preparation of the array substrate.

Description

technical field [0001] The present invention relates to the field of display technology, in particular to an array substrate, a preparation method thereof, and a display device. Background technique [0002] In large-size thin film transistor-liquid crystal display (Thin Film Transistor-Liquid Crystal Display, referred to as TFT-LCD), metal copper (Cu) with low resistivity is usually used as the source electrode, drain electrode, and data line material of TFT. Therefore, the degree of data signal delay in the array substrate is reduced. [0003] However, due to the inevitable diffusion phenomenon of Cu atoms under the action of high temperature or external electric field, that is, Cu atoms are very easy to diffuse into the active layer and other film layers (such as gate insulating layer), causing pollution to each film layer. , when the diffusion of Cu atoms is severe, it will also affect the performance of TFT devices and even lead to complete failure of device performanc...

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Problems solved by technology

[0008] In view of this, in order to solve the above problems, the embodiments of the present invention provide an array substrate and its preparation method, and a display device. The array substrate can avoid the situation where Cu is used to prepare the source, drain, and data lines , when forming the barrier layer that prevents the diffusion of Cu atoms, the phenomenon that the gap size uniformity between the source electrode and the drain electrode is poor due to the large difference in the etching rate of Cu and the barrier layer, and reduce the cost of preparing the barrier layer; It can solve the problem that the data signal cannot be turned on after the lack of Cu metal in the array substrate

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