Photoresist feeder and coater

A photoresist supply and photoresist technology, which is applied to the surface coating liquid device, coating, photoplate making process coating equipment, etc., can solve the problems of production line loss, personnel handling burden, liquid leakage, etc. , to achieve low sealing requirements and reduce damage

Inactive Publication Date: 2015-01-14
TCL CHINA STAR OPTOELECTRONICS TECH CO LTD
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  • Abstract
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Problems solved by technology

Pressurize the photoresist storage that needs to be sealed to transfer the photoresist to the supply system through the pipeline, and the photoresist storage needs to be replaced frequently to ensure the supply of colloid and to ensure the sealing; therefore, the connection between the photoresist container and the pipeline is under pressure. In this case, it is necessary not only to maintain the operability of easy replacement, but also to have strong sealing and pressure bearing capacity, so the connection is easily damaged, loosened and leaked, and Low operability due to easy loss of production line capacity and handling burden on personnel

Method used

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  • Photoresist feeder and coater

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Embodiment Construction

[0018] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without creative efforts fall within the protection scope of the present invention.

[0019] see figure 1 , the preferred embodiment of the present invention provides a photoresist supply device 100, which is used for supplying photoresist raw materials during the operation of the coater. The photoresist supply device 100 includes a photoresist container 10 , a photoresist supply system 20 and a buffer container 30 . The buffer container 30 communicates with the photoresist container 10 and the photoresist supply system 20 respectively through the ...

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Abstract

The invention provides a photoresist feeder. The photoresist feeder is characterized by comprising a photoresist container, a photoresist feeding system and a buffering container, wherein the buffering container is respectively communicated with the photoresist container and the photoresist feeding system by virtue of a pipeline; the photoresist in the buffering container is introduced into the photoresist container by virtue of pressure difference between the buffering container and the photoresist container; the photoresist is transmitted to the photoresist feeding system by virtue of pressure difference between the buffering container and the photoresist feeding system. The invention also provides a coater comprising the photoresist feeder.

Description

technical field [0001] The invention relates to a photoresist supply device and a coating machine. Background technique [0002] All include the step of gluing in the existing lithography process, and the purpose of gluing process is to form photoresist film on the wafer surface of lithography; Commonly used gluing method is dynamic spraying, in order to guarantee the quality of lithography process and For continuity, a supply device for supplying photoresist will be provided. For example, a common supply device includes a photoresist storage, a supply system, and a pipeline connecting the photoresist storage and the supply system. Pressurize the photoresist storage that needs to be sealed to transfer the photoresist to the supply system through the pipeline, and the photoresist storage needs to be replaced frequently to ensure the supply of colloid and to ensure the sealing; therefore, the connection between the photoresist container and the pipeline is under pressure. In...

Claims

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Application Information

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IPC IPC(8): G03F7/16B05C11/10
Inventor 何文超陈聪文李俞廷
Owner TCL CHINA STAR OPTOELECTRONICS TECH CO LTD
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