High-sensitivity silicon piezoresistive pressure sensor and its preparation method

A pressure sensor and high-sensitivity technology, applied in the field of pressure sensors and their preparation, high-sensitivity silicon piezoresistive pressure sensors and their preparation, can solve the problem of increasing the difficulty of the piezoresistor process, increasing the position change rate, and increasing the thinning process Difficulty and other problems, to achieve the effect of improving yield and reliability, improving stability, and simple methods

Active Publication Date: 2017-04-12
华景传感科技(无锡)有限公司
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

For sensors requiring high sensitivity, the sensitivity can only be improved by reducing the thickness of the film without increasing the area, but this increases the difficulty of the thinning process, and as the thickness of the film decreases, the rate of change of stress with position changes. Large, for pressure sensors with the same performance, this greatly increases the difficulty of making piezoresistors

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  • High-sensitivity silicon piezoresistive pressure sensor and its preparation method
  • High-sensitivity silicon piezoresistive pressure sensor and its preparation method
  • High-sensitivity silicon piezoresistive pressure sensor and its preparation method

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Embodiment Construction

[0055] The present invention will be further described below in conjunction with specific drawings and embodiments.

[0056] Such as figure 1 , figure 2 , image 3 and Figure 4 Shown: In order to improve the sensitivity without increasing the area of ​​the pressure sensor and the difficulty of the process, the present invention includes a silicon substrate 1; The upper part is sealed to form a vacuum chamber 5; the central area of ​​the strain film 3 is concavely provided with a stress concentration area 4, and the stress concentration area 4 is located directly above the vacuum chamber 5; strain resistance 6, the strain resistance 6 is located at the outer circle of the stress concentration area 4 and above the vacuum chamber 5; the strain resistance 6 on the strain film 3 is electrically connected through the metal electrode 10 above the strain film 3 to form a Wheatstone bridge ; The metal electrode 10 and the strain film 3 are separated by the protective layer 9 .

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Abstract

The invention relates to pressure sensors and preparation methods thereof, in particular to a high-sensitivity silicon piezoresistance pressure sensor and a preparation method thereof, and belongs to the technical field of semiconductor pressure sensors. According to the technical scheme, the high-sensitivity silicon piezoresistance pressure sensor comprises a silicon substrate which is provided with a strain membrane in an attached mode, and the upper portion of the inside of the silicon substrate is sealed by the strain membrane to form a vacuum cavity. A stress concentration area is arranged at the center area of the strain membrane in a concave mode, and the stress concentration area is located over the vacuum cavity. The strain membrane is provided with a strain resistor used for forming a Wheatstone bridge arm, and the strain resistor is placed on the outer circle of the stress concentration area and is placed above the vacuum cavity. The strain resistor on the strain membrane is electrically connected through a metal electrode above the strain membrane to form a Wheatstone bridge. The metal electrode and the strain membrane are isolated through a protection layer. The high-sensitivity silicon piezoresistance pressure sensor is compact in structure, the sensitivity is improved under the premise that the area of the pressure sensor and the technology difficulty are not increased, and safety and reliability are achieved.

Description

technical field [0001] The invention relates to a pressure sensor and a preparation method thereof, in particular to a high-sensitivity silicon piezoresistive pressure sensor and a preparation method thereof, belonging to the technical field of semiconductor pressure sensors. Background technique [0002] Due to the characteristics of small size, light weight, high precision, good temperature characteristics, and compatibility with semiconductor integrated circuit technology, semiconductor sensors have been applied to a very wide range of fields, such as automobiles, medicine, aerospace, and the environment. [0003] In recent years, MEMS pressure sensors have gradually replaced traditional mechanical quantity sensors in the fields of automotive electronics, consumer electronics and industrial electronics, and have broad market prospects, such as tire pressure monitoring pressure sensors, engine oil pressure sensors, automotive brake system air pressure sensors and automotive...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G01L1/22G01L9/04
Inventor 缪建民
Owner 华景传感科技(无锡)有限公司
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