Energy detection device for photoetching machine

Abstract

The invention discloses an energy detection device for a photoetching machine, which is characterized by comprising a reflector, an integral rod, a detector, a detector signal processing circuit, a signal acquisition card and a computer sequentially along the light advancing direction, wherein the integral rod is located on the focal plane of the reflector; the output end of the detector is connected with a current signal input end of the detector signal processing circuit; and the output end of the detector signal processing circuit is connected with the input end of the computer via the signal acquisition card. The reflector is adopted to bend a light path, thereby reducing the entire height of the photoetching machine; the detector signal processing circuit can perform amplification, integration and keeping on narrow pulse signals, thereby reducing demands of a subsequent signal acquisition circuit and effectively eliminating influences of aperture jitter on a measurement result during the signal acquisition process; and synchronous signals of an integral keeping circuit do not need to be inputted from outside the energy detection device, thereby effectively isolating outer noise signals and improving the anti-interference ability of the energy detection device.

Description

technical field [0001] The invention relates to a photolithography machine, in particular to an energy detection device for a photolithography machine. technical background [0002] Optical lithography is the optical exposure process that transfers the pattern on the mask to the silicon wafer. According to different exposure methods, optical lithography can be divided into contact lithography, proximity lithography, step-and-repeat projection lithography, step-and-scan projection lithography, etc. Step and scan projection lithography can effectively improve the productivity of chips, and has become the mainstream lithography technology. [0003] A photolithographic apparatus is an apparatus that applies a desired pattern to a target portion of a workpiece. Such workpieces may include substrates used in the fabrication of semiconductor devices, various integrated circuits, flat panel displays, circuit boards, biochips, micromechanical electronic chips, optoelectronic circui...

AI Technical Summary

Problems solved by technology

Although the energy sensor can improve the dose control performance of the lithography device, the length of the entire device is relatively large, which will increase the height of the entire lithography machine; only differential amplification is used to process the signal of the photodetector without integrating the signal It has high requirements on the performance of the subsequent signal acquisition circuit, and the accuracy of the measurement results is easily affected by the aperture jitter of the signal acquisition circuit

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