Etching solution
A technology of etching solution and content, applied in the field of chemical etching process, can solve the problems of large surface opening, affecting visual effect, and poor touch feeling of processed workpieces.
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example 1
[0028] In example 1, adopt following method to prepare etching solution: first, take by weight 15% iron trichloride, 30% hydrofluoric acid, 2% phosphoric acid and 53% water respectively; Dissolve ferric chloride in water to obtain a premixed solution; when the obtained premixed solution is cooled to room temperature, add hydrofluoric acid and phosphoric acid, and mix well to obtain an etching solution.
example 2
[0030] In example 2, adopt following method to prepare etching solution: first, take by weight 20% iron trichloride, 35% hydrofluoric acid, 3% phosphoric acid and 42% water respectively; Dissolve ferric chloride in water to obtain a premixed solution; when the obtained premixed solution is cooled to room temperature, add hydrofluoric acid and phosphoric acid, and mix well to obtain an etching solution.
example 3
[0032] In example 3, adopt following method to prepare etching solution: first, take by weight 25% iron trichloride, 50% hydrofluoric acid, 5% phosphoric acid and 20% water respectively; Dissolve ferric chloride in water to obtain a premixed solution; when the obtained premixed solution is cooled to room temperature, add hydrofluoric acid and phosphoric acid, and mix well to obtain an etching solution.
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