Etching solution

A technology of etching solution and content, applied in the field of chemical etching process, can solve the problems of large surface opening, affecting visual effect, and poor touch feeling of processed workpieces.

Inactive Publication Date: 2015-03-18
SAMSUNG GUANGZHOU MOBILE R&D CENT +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the graphics processed by the existing etching solution often have a shape with large surface openings and small internal openings, and its cross-section is like...

Method used

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Examples

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example 1

[0028] In example 1, adopt following method to prepare etching solution: first, take by weight 15% iron trichloride, 30% hydrofluoric acid, 2% phosphoric acid and 53% water respectively; Dissolve ferric chloride in water to obtain a premixed solution; when the obtained premixed solution is cooled to room temperature, add hydrofluoric acid and phosphoric acid, and mix well to obtain an etching solution.

example 2

[0030] In example 2, adopt following method to prepare etching solution: first, take by weight 20% iron trichloride, 35% hydrofluoric acid, 3% phosphoric acid and 42% water respectively; Dissolve ferric chloride in water to obtain a premixed solution; when the obtained premixed solution is cooled to room temperature, add hydrofluoric acid and phosphoric acid, and mix well to obtain an etching solution.

example 3

[0032] In example 3, adopt following method to prepare etching solution: first, take by weight 25% iron trichloride, 50% hydrofluoric acid, 5% phosphoric acid and 20% water respectively; Dissolve ferric chloride in water to obtain a premixed solution; when the obtained premixed solution is cooled to room temperature, add hydrofluoric acid and phosphoric acid, and mix well to obtain an etching solution.

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Abstract

The invention provides an etching solution which is prepared from the following components by weight: 15%-25% of ferric trichloride, 30%-50% of hydrofluoric acid, 2%-5% of phosphoric acid, and the balance being water. Preferably, in the etching solution, on a weight basis, the content of ferric trichloride is 20%-25%, the content of hydrofluoric acid is 35%-50%, the content of phosphoric acid is 2%-3%, and the balance is water. The etching solution of the present invention can realize high etching efficiency and excellent processing effect, and can also form convex-concave fluctuating and smooth transitional surface microstructures.

Description

technical field [0001] The invention relates to the field of chemical etching technology, in particular to an etching solution used for etching processing of mold steel. Background technique [0002] Chemical etching is the process of quickly dissolving and removing undesired metals through chemical reactions using the corrosive action of chemical solutions. Metal etching must use efficient and stable etching solution to achieve efficient and stable etching function, so that the precision of etching products can meet higher processing requirements. The chemical etching process performs spray etching on the workpiece processed by the mask, and adjusts the spray pressure through the hydraulic system. In order to ensure the uniformity of processing, the processing sample is placed on the rotatable worktable, and the processing time is set, and the etching process of the mold steel can be carried out. The existing etching solution is suitable for rapid etching of microstructur...

Claims

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Application Information

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IPC IPC(8): C23F1/28
Inventor 张永俊王冠宋卿
Owner SAMSUNG GUANGZHOU MOBILE R&D CENT
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