Method for inhibiting metal surface carbon deposition by using atomic layer deposition passivation layer
An atomic layer deposition and metal passivation technology, applied in metal material coating process, coating, gaseous chemical plating, etc., can solve the problems of catalyst deactivation, easy peeling of coating, difficult thickness control, etc., to achieve the degree of automation High and repeatable results
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Embodiment 1
[0039] This embodiment provides a method for suppressing carbon on the surface of a metal by using an atomic layer deposition passivation layer. The method specifically includes the following steps:
[0040] Step 1, immerse a metal tube with an inner diameter of 2 mm and a length of 1100 mm in acetone, clean it for 40 minutes under the action of ultrasonic waves to remove oil stains and impurities, and pass the cleaned metal tube through the fixing device (see figure 2 ) is connected to the air circuit of the ALD system, so that the air flow in the system passes through the metal pipe;
[0041]Step 2, seal the reaction chamber, feed nitrogen into the atomic layer deposition system and vacuumize, adjust the outlet valve of the reaction chamber to control the pressure in the chamber to 133Pa, and maintain the temperature of the reaction chamber at 100°C;
[0042] Step 3: Inject the first reaction precursor, trimethylaluminum, into the reaction chamber for 8 s; pass in an inert ...
Embodiment 2
[0047] Identical with other conditions of embodiment 1, repeatedly carry out the Al of 1000 cycles 2 o 3 Atomic layer deposition generates a passivation layer with a thickness of 98nm on the inner wall of the metal tube.
Embodiment 3
[0049] Identical with other conditions of embodiment 1, repeatedly carry out the Al of 2000 cycles 2 o 3 Atomic layer deposition generates a passivation layer with a thickness of 196nm on the inner wall of the metal tube.
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