Device and method for performing in-situ double-tilting single-axis stretching on nanowire and two-dimensional laminar thin film in transmission electron microscope
A technology of transmission electron microscopy and uniaxial stretching, which is applied in the direction of applying stable tension/pressure to test the strength of materials, can solve the problems of non-reusability, low utilization rate, high price, etc., saving time cost and price cost, Easy fixation and high sample size requirements
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment Construction
[0034] The present invention will be specifically described below in conjunction with the accompanying drawings, but the present invention is not limited to the following embodiments.
[0035] The in-situ double-tilt uniaxially stretched nanowire and two-dimensional layered thin film device in a transmission electron microscope is characterized in that it includes three parts: a supporting part, a driving part and a carrier network. The supporting part is a metal ring 1 with an outer diameter of 3mm and an inner diameter of 2mm, and the inner structure is horseshoe-shaped, and the "horseshoe platform" is used to fix one end of the thermal bimetal. The material of the metal ring is copper with good thermal conductivity, and the thickness is between 25 μm and 30 μm. The driving part is a thermal bimetal 2, and the material used is a non-magnetic metal with a large difference in thermal expansion coefficient (such as copper and titanium), the length of the free end is greater tha...
PUM
Property | Measurement | Unit |
---|---|---|
Outer diameter | aaaaa | aaaaa |
The inside diameter of | aaaaa | aaaaa |
Thickness | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com