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Technology for processing nanowire single-photon detector by using micro-nano mask plate

A single-photon detector and nanowire technology, applied in nanotechnology, instruments, etc., can solve problems such as high cost, time-consuming, and serialization

Active Publication Date: 2015-06-03
TIANJIN UNIV
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Problems solved by technology

[0003] In order to overcome the deficiencies of the prior art, the present invention aims to solve the serial, time-consuming and high-cost problems of SNSPD in the processing technology, and then realize the large-scale and batch production of SNSPD, and promote the industrialization process of SNSPD

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  • Technology for processing nanowire single-photon detector by using micro-nano mask plate
  • Technology for processing nanowire single-photon detector by using micro-nano mask plate

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Embodiment Construction

[0028] The overall technical scheme of the invention is: a plurality of SNSPD nanowire patterns are made on a small piece of film material, and this is used as a mask, and the mask is used for sputtering on the substrate where the nanowires need to be processed, so that the nanographs Transfer to the substrate, and the template can be reused. Specifically, it can be divided into the following steps:

[0029] 1. Acquisition of thin film materials: Since the thickness of nanowires is usually several nanometers, the thickness requirements for templates are also relatively high. Usually, the thickness of a single silicon wafer bought directly from the market is much greater than our ideal value, so the thin film is only It can be obtained by the following methods: ① select a silicon on insulator (SOI) wafer and clean it; ② coat the upper surface of the SOI wafer with electron etching glue for electron beam exposure; ③ put Develop the exposed wafer; ④Reactive ion beam etching is p...

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Abstract

The invention belongs to the technical field of phoelectron and nano processing, and aims to solve the problems of series, time waste and high cost of an SNSPD (superconducting-nanowire single-photon detector) in the processing technology in order to realize large-scale and batch production of the SNSPD and propulsion of the industrial progress of the SNSPD. According to the technical scheme, by the technology for processing a superconducting-nanowire single-photon detector, a plurality of SNSPD nanowire graphs are formed on a small-sized thin film material to form the mask plate; a substrate to be subjected to nanowire processing is sputtered by the mask plate, so that the nanowire graphs are transferred to the substrate; furthermore, the mask plate can be repeatedly used. The technology is mainly applied to large-scale and batch production of the SNSPD.

Description

technical field [0001] The invention belongs to the technical field of optoelectronics and also belongs to the technical field of nanometer processing. Specifically, it relates to the process of using a micro-nano mask to process a nanowire single-photon detector. technical background [0002] Superconducting-nanowire single-photon detectors (hereinafter referred to as SNSPD) is a single-photon detection technology emerging after 2001. This technology has gradually become a mainstream technology in the field of infrared single-photon detection because of its advantages of high efficiency in a wide spectral range, fast speed, small time-domain jitter, and extremely low dark count. The detectors are made of superconducting nanowires processed "top-down" by the nanofabrication method. The width of the nanowire is less than 100 nanometers, the thickness is 4-6 nanometers, and the length is usually several hundred micrometers. The core step in the process of nanowire processin...

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01J11/00B82Y40/00
Inventor 胡小龙朱晓田程宇豪顾超
Owner TIANJIN UNIV
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