Carbon pollution cleaning method of EUV optical element

A technology for optical components and carbon pollution, applied in chemical instruments and methods, cleaning methods and utensils, cleaning flexible objects, etc., can solve the problems of damaging the surface of optical components, changing the multilayer film structure of EUV optical components, etc., achieving low cost, The effect of less damage and avoiding damage

Inactive Publication Date: 2015-08-12
CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI
View PDF5 Cites 4 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] In view of this, the purpose of the present invention is to provide a carbon pollution cleaning method for EUV optical components, so as to solve the problems of damaging...

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Carbon pollution cleaning method of EUV optical element
  • Carbon pollution cleaning method of EUV optical element
  • Carbon pollution cleaning method of EUV optical element

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0033] see figure 1 , where 1 represents the plasma emitter, 2 represents the vacuum pump, 3 represents the cleaning chamber, and 4 represents the optical component sample contaminated by carbon exposure. The specific cleaning process is:

[0034] 1) Put the optical element sample 4 contaminated by carbon exposure into the cleaning chamber 3, and use the vacuum pump 2 to vacuum the cleaning chamber 3, and the vacuum degree is required to reach 10 -5 above mbar;

[0035] 2) Start the plasma emitter 1 and inject carbon dioxide with a supply flow rate of 2 sccm, so that the entire cleaning chamber 3 is filled with plasma carbon dioxide, and the surface carbon-contaminated sample 4 is immersed in the plasma carbon dioxide atmosphere, so that carbon dioxide and The deposited carbon reacts to generate carbon monoxide to realize the cleaning of the optical element sample, and the vacuum pump 2 pumps out the carbon monoxide generated in the cleaning chamber 3 .

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention provides a carbon pollution cleaning method of an EUV optical element, comprising the following steps: 1) placing the optical element in a cleaning cavity and vacuumizing the cleaning cavity; 2) injecting carbon dioxide in the cleaning cavity via a plasma transmitter to fill the cleaning cavity with the carbon dioxide in a plasma state, and cleaning the carbon pollution through oxidation reaction between the carbon dioxide in the plasma state and deposited carbon on the surface of the optical element. The cleaning method is simple, convenient and low in cost with less harm to the optical element.

Description

technical field [0001] The invention relates to the field of ultra-fine processing of optical elements, and in particular provides a carbon pollution cleaning method for EUV optical elements. Background technique [0002] In extreme ultraviolet (EUV) lithography technology, under the irradiation of EUV light, the hydrocarbons in the system will be cracked to produce free carbon, which will be adsorbed and deposited on the surface of optical components, forming carbon pollution, because carbon can absorb EUV band radiation, the reflectivity is greatly affected, which will greatly affect the working efficiency of the optical system. [0003] In order to prolong the service life of EUV multilayer optical components, the carbon deposition pollution on the surface of optical components should be cleaned in time to restore the reflectivity of optical components. At present, carbon pollution cleaning technologies include plasma oxygen, plasma hydrogen, hydrogen atoms, ozone, etc. ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): G03F7/20B08B11/00B08B7/00
Inventor 王依卢启鹏龚学鹏
Owner CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap