Sputtering target for forming ag alloy film, ag alloy film, ag alloy reflective film, ag alloy conductive film, ag alloy translucent film
An alloy film, sputtering target technology, applied in sputtering coating, circuits, discharge tubes, etc., can solve the deterioration of Ag film, the change of particle specific resistance, salt water resistance, heat resistance, moisture resistance and insufficient resistance and other problems, to achieve various effects of excellent resistance
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Embodiment 1
[0066] Hereinafter, the results of evaluation tests for evaluating the effects of the sputtering target for forming an Ag alloy film and the Ag alloy film (Ag alloy reflective film) according to the present invention will be described.
[0067]
[0068] Ag with a purity of 99.9% by mass or more, Sb and Mg with a purity of 99.9% by mass or more were prepared as melting raw materials, and the amounts to obtain the predetermined composition shown in Table 1 were weighed.
[0069] Next, Ag was melted in an inert gas atmosphere in a melting furnace, and Sb and Mg were added to the obtained molten Ag, followed by melting in an inert gas atmosphere. After that, it was poured into a mold to manufacture an ingot having the composition shown in Table 1. More specifically, when melting Ag, the atmosphere was set to vacuum once (5×10 -2 Pa or less) and then carried out in an atmosphere replaced with Ar gas. Furthermore, Sb and Mg were added in an Ar gas atmosphere.
[0070] Next, aft...
Embodiment 2
[0101] Next, the results of evaluation tests for evaluating the effects of the sputtering target for forming an Ag alloy film and the Ag alloy film (Ag alloy conductive film) according to the present invention will be described.
[0102]
[0103] Ag with a purity of 99.9% by mass or more, Sb and Mg with a purity of 99.9% by mass or more were prepared as melting raw materials, and the amounts to obtain the predetermined composition shown in Table 4 were weighed.
[0104] Next, Ag was melted in an inert gas atmosphere in a melting furnace, and Sb and Mg were added to the obtained molten Ag, followed by melting in an inert gas atmosphere. After that, it was poured into a mold to manufacture an ingot having the composition shown in Table 4. More specifically, when melting Ag, the atmosphere was set to vacuum once (5×10 -2 Pa or less) and then carried out in an atmosphere replaced with Ar gas. Furthermore, Sb and Mg were added in an Ar gas atmosphere.
[0105] Next, after cold...
Embodiment 3
[0128] Next, the results of an evaluation test for evaluating the effect of the Ag alloy film (Ag alloy semitransparent film) formed using the sputtering target of Example 2 will be described.
[0129]
[0130] The above-mentioned sputtering target was installed in a sputtering device, and the distance from the glass substrate (eagleXG manufactured by Corning Incorporated): 70mm, power: DC 250W, ultimate vacuum degree: 5×10 -5 Pa, Ar gas pressure: Sputtering was performed under the condition of 0.6 Pa to prepare a sample having an Ag alloy film (Ag alloy semitransparent film) having a thickness shown in Table 5 formed on the surface of the glass substrate.
[0131] And, using the sputtering target of the said conventional example, the sample which formed the Ag film (Ag semitransparent film) which has the film thickness shown in Table 5 on the glass substrate was produced under the same conditions.
[0132] In addition, the measurement of the film thickness of the Ag alloy s...
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Abstract
Description
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