Method for preparing FeSeTe film by pulse laser deposition coating technology
A pulsed laser deposition, iron-selenium technology, applied in the field of high-temperature superconducting thin films, can solve the problems of easy introduction of impurities and unfavorable film growth, and achieve the effect of overcoming the introduction of impurities, easy composition, and good crystal structure
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Embodiment 1
[0021] 1. FeSe 0.5 Te 0.5 Target preparation:
[0022] a) Fe, Se, Te powders are mixed and ground evenly in a molar ratio of 1:0.5:0.5;
[0023] b) The ground powder is sintered in a vacuum quartz tube at 700°C for 24 hours, and quenched at 400°C;
[0024] c) The sintered iron selenium tellurium is ground into powder again, and then pressed into a target with a diameter of 1 inch and a thickness of 2 mm;
[0025] d) The suppressed FeSe 0.5 Te 0.5 Sinter at 700°C for 24 hours in a vacuum quartz tube, and quench at 400°C.
[0026] 2. Pulsed laser deposition on SrTiO 3 FeSe grown on the substrate 0.5 Te 0.5 The thin film method is as follows:
[0027] a) SrTiO 3 Substrate and FeSe 0.5 Te 0.5 The target is put into the growth chamber, and the vacuum is evacuated to 10 -8 mbar, heat the substrate to 310°C through the heating wire in the substrate holder, wait until the temperature stabilizes, and the air pressure reaches 10 -7 about mbar;
[0028] b) Adjust laser par...
Embodiment 2
[0033] 1. FeSe 0.7 Te 0.3 Target preparation:
[0034] a) Fe, Se, Te powders are mixed and ground evenly in a molar ratio of 1:0.7:0.3;
[0035] b) The ground powder is sintered in a vacuum quartz tube at 700°C for 24 hours, and quenched at 400°C;
[0036] c) The sintered iron selenium tellurium is ground into powder again, and then pressed into a target with a diameter of 1 inch and a thickness of 2 mm;
[0037] d) The pressed material is sintered in a vacuum quartz tube at 700°C for 24 hours, and quenched at 400°C.
[0038] 2. Pulsed laser deposition on LaAlO 3 FeSe grown on the substrate 0.7 Te 0.3 The thin film method is as follows:
[0039] a) LaAlO 3 Substrate and FeSe 0.7 Te 0.3 The target is put into the growth chamber, and the vacuum is evacuated to 10 -8 mbar, heat the substrate to 310°C through the heating wire in the substrate holder, wait until the temperature stabilizes, and the air pressure reaches 10 -7 about mbar;
[0040] b) Adjust laser paramete...
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