Forming method of semiconductor structure
A semiconductor and patterning technology, used in semiconductor devices, semiconductor/solid-state device manufacturing, electrical components, etc., can solve problems such as short circuits in flash memory, and achieve the effect of improving reliability and avoiding short circuits.
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[0027] As mentioned in the background art, the flash memory formed in the prior art often has problems such as failure or short circuit.
[0028] The present invention provides an embodiment of the formation process of a semiconductor structure, please refer to Figure 1 to Figure 4 , is a structural schematic diagram of the semiconductor formation process of the embodiment.
[0029] Please refer to figure 1 , a schematic top view after the first patterning is performed on the floating gate 10 and the continuous control gate 20 is formed. figure 1 In , the control gate dielectric layer, semiconductor substrate, etc. are not shown.
[0030] The floating gates 10 are arranged in parallel, and the continuous control gates 20 cover several floating gates 10. Since the control gates 20 belong to different memory cells, the second patterning of the control gates 20 is required to remove figure 1 Part of the control gate 21 in the dotted frame part is used to disconnect the cont...
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