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Method for producing ozone gas-dissolved water and method for cleaning electronic materials

一种制造方法、溶解水的技术，应用在使用液体的清洁方法、半导体/固态器件制造、化学仪器和方法等方向，能够解决大污泥等问题

Active Publication Date: 2018-08-24
KURITA WATER INDUSTRIES LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Through this waste liquid treatment, a large amount of sludge is generated

Method used

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  • Method for producing ozone gas-dissolved water and method for cleaning electronic materials
  • Method for producing ozone gas-dissolved water and method for cleaning electronic materials

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0098] according to figure 1 The shown ozone gas-dissolved water supply system performs production of ozone gas-dissolved water and washing of objects to be cleaned.

[0099] The apparatus used is described below.

[0100] Degassing membrane module: "Liqui-Cel G248 (リキセル G248)" manufactured by Polypore;

[0101] Gas-dissolving membrane module: "GNH-01R" manufactured by Japan GORE-TEX Company (Japango Artex Corporation);

[0102] Ozone generator: "GR-RB" manufactured by Sumitomo Precision Industries, Ltd.

[0103] As supply water (pure water), degassing treatment is performed in the degassing membrane module 1 , and water with a dissolved oxygen concentration of about 10 ppb is supplied to the gas-dissolving membrane module 3 . The water supply volume was set to 10 L / min (L / min), and the water temperature of the water supply and the place of use was set to 25°C. The amount of oxygen supplied to the ozone generator 5 was set at 280 NmL / min from the saturation solubility (sat...

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PUM

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Abstract

Produces ozone gas-dissolved water with a high concentration of dissolved ozone gas and suppressed bubbling of oxygen in the place of use. Using the produced ozone gas to dissolve water, the electronic material can be cleaned efficiently by avoiding uneven cleaning or machine damage caused by air bubbles. When the mixed gas of ozone gas and oxygen and the degassed water are supplied to the ozone dissolving unit and the mixed gas is dissolved in the supplied water to produce ozone gas dissolved water, the amount of the mixed gas supplied to the ozone dissolving unit is controlled so that The sum of the amount of oxygen in the mixed gas and the amount of dissolved oxygen in the feed water when all the ozone in the mixed gas is assumed to be decomposed into oxygen is set to be equal to or less than the saturated solubility of oxygen under the conditions of use of the obtained ozone gas-dissolved water.

Description

technical field [0001] The present invention relates to a method for producing ozone gas-dissolved water suitable for wet cleaning of electronic materials (electronic parts, electronic equipment, etc.) net method. Background technique [0002] In order to remove particles, organic substances, metals, etc. from the surface of electronic materials such as silicon substrates for semiconductors, glass substrates for flat panel displays, and quartz substrates for photomasks, the so-called RCA cleaning method is performed with hydrogen peroxide. Wet cleaning at high temperature with thick liquid based chemicals. The RCA cleaning method is an effective method for removing metals on the surface of electronic materials, but since a large amount of high-concentration acid, alkali or hydrogen peroxide is used, these chemicals are discharged into the waste liquid, and neutralization is required Or waste liquid treatment such as precipitation treatment. A large amount of sludge is pro...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/304B08B3/08
CPCC02F1/20C02F1/78H01L21/02052C02F2103/346
Inventor 床嶋裕人森田博志
Owner KURITA WATER INDUSTRIES LTD
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