Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Method for manufacturing magnetic mask plate for coating by evaporation

A manufacturing method and a technology of a mask plate, which are applied in vacuum evaporation plating, sputtering plating, ion implantation plating, etc., can solve problems such as unfavorable, limited resolution of OLED products, and sagging of the board surface

Inactive Publication Date: 2015-11-18
KUN SHAN POWER STENCIL
View PDF5 Cites 17 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

figure 2 shown as figure 1 The enlarged schematic diagram of the cross-section in the A-A direction in the middle, 20 is the mask part, and 21 is the mask opening when the organic material is evaporated. Since the mask plate 11 is generally made of a metal sheet through an etching process, it constitutes the mask of the mask pattern (10). The size of the mold part (20) and the opening (21) will be limited by the thickness h of the metal sheet itself (h is generally greater than 30 μm) and the process, thereby limiting the resolution of the final OLED product; in other words, the width of the opening (21) It is difficult to make the size d1 smaller (at present, openings with d1 less than 30um are very difficult to make), even if it can be made small, openings with a large aspect ratio cannot meet the high-quality evaporation process
In addition, if a large-sized mask is produced, the metal-type mask body 11 will have a relatively large mass, which will cause the surface of the mask body 11 to sag (that is, a concave phenomenon will appear in the middle of the surface), which will affect the accuracy. The higher mask evaporation process is detrimental

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method for manufacturing magnetic mask plate for coating by evaporation
  • Method for manufacturing magnetic mask plate for coating by evaporation
  • Method for manufacturing magnetic mask plate for coating by evaporation

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0062] Embodiments of the present invention are described in detail below, examples of which are shown in the drawings, wherein the same or similar reference numerals designate the same or similar elements or elements having the same or similar functions throughout. The embodiments described below by referring to the figures are exemplary only for explaining the present invention and should not be construed as limiting the present invention.

[0063] In describing the present invention, it should be understood that the terms "upper", "lower", "bottom", "top", "front", "rear", "inner", "outer", "horizontal", " The orientation or positional relationship indicated by "vertical", etc. is based on the orientation or positional relationship shown in the drawings, which is only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, so as to Spe...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
thicknessaaaaaaaaaa
sizeaaaaaaaaaa
Login to View More

Abstract

The invention discloses a method for manufacturing a mask plate. The method is completely different from an existing etching process, and includes the steps that 1, a metal supporting layer is manufactured; 2, the surface of the metal supporting layer is covered with a film; 3, the light-blocking film layer is subjected to exposure; and 4, the light-blocking film layer is developed. According to the magnetic mask plate manufactured through the method, the organic mask layer of the mask plate can be quite thin, the width of an opening is further made smaller, and therefore the finally formed magnetic mask plate can be subjected to coating by evaporation to form OLED products of higher resolution ratios.

Description

technical field [0001] The invention belongs to the display panel industry, and relates to a mask plate for evaporation used in the production process of an OLED display panel, in particular to a method for manufacturing a magnetic mask plate for evaporation. Background technique [0002] Because organic light-emitting diodes (Organic Light-Emitting Diode, OLED) have self-illumination at the same time, no backlight is required, high contrast, thin thickness, wide viewing angle, fast response speed, can be used for flexible panels, wide operating temperature range, structure It is considered to be the next-generation flat-panel display emerging application technology due to its excellent characteristics such as simple manufacturing process. [0003] The most important part in the OLED production process is to deposit the organic layer on the substrate according to the requirements of the drive matrix to form the key light-emitting display unit. OLED is a solid material, and ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/04C23C14/24H01L51/56
CPCC23C14/04C23F1/04C23F1/02
Inventor 魏志凌赵录军魏志浩张炜平
Owner KUN SHAN POWER STENCIL
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products