Laser direct writing vertical double-sided exposure system
A technology of double-sided exposure and laser direct writing, applied in microlithography exposure equipment, photolithographic process exposure devices, optics, etc., can solve the problems of difficult to increase production capacity, difficult to operate time, etc. Efficiency, the effect of increasing productivity
Inactive Publication Date: 2015-11-18
JIANGSU YSPHOTECH INTERGRATED CIRCUIT EQUIP CO LTD
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Problems solved by technology
According to the current structural system, each operation process has reached the upper limit of time-consuming, and it is difficult to shorten the operation time of a certain operation step, that is, the direct-write lithography machine with a single workpiece table has already reached the upper limit of time-consuming due to the serial nature of each operation process. Difficult to increase production capacity
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[0011] The present invention will be further described below in conjunction with accompanying drawing.
[0012] Such as figure 1 As shown, a laser direct writing vertical double-sided exposure system, the system includes a base 3 and an exposed workpiece 1, the exposed workpiece 1 is placed vertically above the base 3, and one end of the exposed workpiece 1 It is movably connected with the base 3; a left moving optical path 4 and a right moving optical path 2 are respectively arranged on both sides of the exposed workpiece 1, and the left moving optical path 4 and the right moving optical path 2 are respectively perpendicular to the exposed workpiece. Wherein, when the workpiece to be exposed moves along the Y direction, the left moving optical path 4 and the right moving optical path 2 move along the Z direction respectively. The exposure system can simultaneously expose the front and back sides of the workpiece 1 to be exposed. The exposed workpiece 1 includes a PCB board ...
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The invention discloses a laser direct writing vertical double-sided exposure system. The system comprises a base and a workpiece to be exposed and is characterized in that the workpiece to be exposed is perpendicularly arranged above the base, one end of the workpiece to be exposed is movably connected with the base, the two sides of the workpiece to be exposed are respectively provided with a left moving optical path and a right moving optical path, and the left moving optical path and the right moving optical path are perpendicular to the workpiece to be exposed. By the system, the front side and the back side of the workpiece to be exposed can be simultaneously exposed, thus, the working efficiency is increased by twice, capacity is better, and the working efficiency is improved.
Description
technical field [0001] The invention relates to an exposure system, in particular to a laser direct writing vertical double-sided exposure system, which belongs to the technical field of rapid scanning exposure of direct writing photolithography machines. Background technique [0002] Direct-write lithography technology is a direct image transfer technology that has developed rapidly in recent years and replaces traditional mask-type lithography technology. It has an increasingly important position in the field of semiconductor and PCB production. Using this technology can shorten the process flow and reduce production costs. At present, most of the mainstream direct-writing lithography machines on the market perform scanning exposure in the form of a single workpiece table. After the exposure of the A side of the exposed workpiece is completed, the copy is performed, and then the B side is exposed. In a single stage system, loading, alignment, exposure, and unloading of su...
Claims
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IPC IPC(8): G03F7/22G03F7/20
Inventor 赵华张伟陈旻峰
Owner JIANGSU YSPHOTECH INTERGRATED CIRCUIT EQUIP CO LTD