Nano-structure and preparation method thereof

A nano-structure, cone-shaped technology, applied in the nano field, can solve the problems of difficult to achieve large-scale commercial production and high production costs, and achieve the effects of large roughness, strong controllability and simple process

Active Publication Date: 2015-11-25
苏州研材微纳科技有限公司
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Problems solved by technology

[0003] At present, the preparation of nanostructures mainly adopts electron-beam lithography (Electron-Beam Lithography), focused ion beam (Focused Ion Beam, FIB) etching, femtosecond laser-assisted etching and other methods. Processing mode, high production cost, difficult to achieve large-scale commercial production
In addition, there are self-catalyzed VLS chemical synthesis growth technology, electrochemical wet etching technology and nano-ball etching technology to prepare nanostructures. These technologies have more or less problems in process complexity or process controllability, and it is difficult to Achieving large-scale commercial production

Method used

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preparation example Construction

[0034] The invention provides a method for preparing a nanostructure, referring to figure 1 As shown, comprising: providing a substrate; forming a polymer layer on the substrate; bombarding the polymer layer with plasma to form a columnar nanostructure; using the columnar nanostructure as a mask, anisotropically etching the substrate , to form cone-like nanostructures; remove columnar nanostructures.

[0035] In the preparation method of the present invention, plasma technology is used to bombard the polymer layer. During the bombardment process, the product produced by the bombardment polymer will polymerize again to form a columnar nanostructure, and then further anisotropy of the substrate Etching to form a cone-shaped nanostructure, which has a large surface area and surface-to-volume ratio, and has a large roughness, optical absorption characteristics, and plasmonic oscillation enhancement effect, which can be widely used. At the same time , the method has a simple proce...

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Abstract

The invention discloses a preparation method of a nano-structure. The preparation method comprises the following steps: providing a substrate; forming a polymer layer on the substrate; bombarding the polymer layer with plasma to form a columnar nano-structure; performing anisotropic etching on the substrate by taking the columnar nano-structure as a mask to form a conical nano-structure; and removing the columnar nano-structure. The method is simple in process, high in controllability, and suitable for large-scale commercialized production. Nano-structures can be machined in batches and in parallel.

Description

technical field [0001] The invention belongs to the field of nanotechnology, and in particular relates to a nanostructure and a preparation method thereof. Background technique [0002] Large-area nanostructures, due to their structural characteristics such as large surface-to-volume ratio, large roughness, large surface area, tips, and porous / slits, present super-hydrophilic / hydrophobic, surface plasmon oscillation enhancement, field emission, light filtering, Light absorption and other properties, so it is often suitable for new energy sources such as self-cleaning surfaces, microfluidic devices, surface-enhanced Raman scattering devices, surface plasmon infrared absorption devices, biomedical detection or functional devices, optoelectronic devices, optical sensor devices, and solar cells. devices, and some other applications. In recent years, large-area nanostructures have become a research hotspot. [0003] At present, the preparation of nanostructures mainly adopts el...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B81C1/00B82Y40/00
Inventor 毛海央唐力程
Owner 苏州研材微纳科技有限公司
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