Shielding disc and reaction chamber

Abstract

The present invention provides a shielding disc and a reaction chamber. The shielding disc comprises a rotation subsection and a body. The rotation subsection is composed of a fixed end and a movable end. The fixed end is arranged along the circumferential direction of the body. The movable end of the rotation subsection is located at an original position under the action of the gravity force thereof. The original position is defined to be the position of the movable end when an included angle between the lower surface of the rotation subsection and the lower surface of the body is preset to be an obtuse angle. When a to-be-shielded object is shielded by the shielding disc, the movable end of the rotation subsection is jacked up from the original position to a preset highest position. In this way, the shielding disc capable of shielding the to-be-shielded object is formed by the rotation subsection and the body. The shielding disc is smaller in size when to be stored. Therefore, no garage for storing the shielding disc is required to be arranged in a reaction chamber, so that the cost of the reaction chamber is reduced. The economic benefit is further improved.

Description

technical field [0001] The invention belongs to the technical field of semiconductor equipment manufacturing, and in particular relates to a shielding plate and a reaction chamber. Background technique [0002] Physical vapor deposition (Physical Vapor Deposition, hereinafter referred to as PVD) equipment is a relatively widely used plasma processing equipment, which is mainly used to deposit thin films on the surface of substrates and other processed workpieces. PVD methods include vacuum evaporation, sputtering coating, and arc plasma coating, and, so far, PVD methods can not only deposit metal films, but also deposit alloy films, compound films, ceramic films, semiconductor films, etc. [0003] In practical applications, usually before the deposition process is performed, it is necessary to perform a cleaning process on the target exposed to the atmosphere or out of service for a period of time (that is, to clean the oxide or other impurities formed on the surface of the ...

AI Technical Summary

Problems solved by technology

[0006] The present invention aims to solve the technical problems existing in the prior art, and provides a shielding plate and a reaction chamber. The size of the shielding plate is small when stored, so there is no need to set up a garage in the reaction chamber to place the shielding plate. Thus, the chamber cost of the reaction chamber can be reduced, which in turn can improve economic efficiency

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