Preparation of metal organic framework membrane and application in gas separation
A gas and gas separation technology, applied in the field of membrane separation, can solve the problems of difficulty in forming large-area, continuous and dense membranes, weak interaction force, and easy falling off of membrane materials, and achieves improved mechanical properties, increased adsorption, and increased contact area. Effect
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Embodiment 1
[0019] Porous metal nickel is used as the substrate, and the substrate membrane area is 4.9cm 2 ; Cobalt nitrate hexahydrate (Co(NO 3 )·6H 2 O, molecular weight 291.1), ammonium fluoride (NH 4 F, molecular weight 37.04), urea (CO(NH 2 ) 2 , molecular weight 60.06); the metal salt for preparing MOF membranes is cobalt nitrate hexahydrate (Co(NO 3 )·6H 2 O, the molecular weight is 291.1), and the organic ligand is 2,5-dihydroxyterephthalic acid (C 8 h 6 o 6 , the molecular weight is 198.1), and the solvent is N,N-dimethylformamide (DMF) and water.
[0020] Film forming conditions and methods:
[0021] (1) The nickel foam is pressed into a porous metal nickel substrate, and the nickel substrate obtained is ultrasonically cleaned with ethanol and deionized water for 20 minutes, and dried at 80° C.;
[0022] (2) 2.49g of cobalt nitrate hexahydrate, 0.748g of ammonium fluoride, and 3.003g of urea were dissolved in 60mL of deionized water to prepare a mixed solution;
[00...
Embodiment 2
[0027] Porous metal nickel is used as the substrate, and the substrate membrane area is 4.9cm 2 ; Cobalt nitrate hexahydrate (Co(NO 3 )·6H 2 O, molecular weight 291.1), ammonium fluoride (NH 4 F, molecular weight 37.04), urea (CO(NH 2 ) 2 , molecular weight 60.06); the metal salt for preparing MOF membranes is cobalt nitrate hexahydrate (Co(NO 3 )·6H 2 O, the molecular weight is 291.1), and the organic ligand is 2,5-dihydroxyterephthalic acid (C 8 h 6 o 6 , the molecular weight is 198.1), and the solvent is N,N-dimethylformamide (DMF) and water.
[0028] Film forming conditions and methods:
[0029] (1) The nickel foam is pressed into a porous metal nickel substrate, and the nickel substrate obtained is ultrasonically cleaned with ethanol and deionized water for 20 minutes, and dried at 80° C.;
[0030] (2) 2.49g of cobalt nitrate hexahydrate, 0.748g of ammonium fluoride, and 3.003g of urea were dissolved in 60mL of deionized water to prepare a mixed solution;
[00...
Embodiment 3
[0035]Porous metal nickel is used as the substrate, and the substrate membrane area is 4.9cm 2 ; Cobalt nitrate hexahydrate (Co(NO 3 )·6H 2 O, molecular weight 291.1), ammonium fluoride (NH 4 F, molecular weight 37.04), urea (CO(NH 2 ) 2 , molecular weight 60.1); the metal salt for preparing MOF membranes is cobalt nitrate hexahydrate (Co(NO 3 )·6H 2 O, the molecular weight is 291.1), and the organic ligand is 2,5-dihydroxyterephthalic acid (C 8 h 6 o 6 , molecular weight 198.1), solvents are N,N-dimethylformamide (DMF), water and ethanol.
[0036] Film forming conditions and methods:
[0037] (1) The nickel foam is pressed into a porous metal nickel substrate, and the nickel substrate obtained is ultrasonically cleaned with ethanol and deionized water for 20 minutes, and dried at 80° C.;
[0038] (2) 2.49g of cobalt nitrate hexahydrate, 0.748g of ammonium fluoride, and 3.003g of urea were dissolved in 60mL of deionized water to prepare a mixed solution;
[0039] (3...
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