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Alkaline P salt plating solution for electroplating platinum and electroplating method thereof

An electroplating solution and a technology of a plating solution, applied in the field of electroplating platinum, can solve the problems of poor performance of the plating solution, poor quality of the plating layer, and low current efficiency of the plating solution, and achieve high cathode current efficiency, good quality of the plating layer, and excellent performance of the plating solution Effect

Inactive Publication Date: 2015-12-09
WUXI QINGYANG MACHINERY MFG
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Although the process is relatively simple, the current efficiency of the plating solution is low, the performance of the plating solution is poor, and the quality of the coating is not good.

Method used

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  • Alkaline P salt plating solution for electroplating platinum and electroplating method thereof
  • Alkaline P salt plating solution for electroplating platinum and electroplating method thereof
  • Alkaline P salt plating solution for electroplating platinum and electroplating method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0026] The formulation of the electroplating solution is as follows:

[0027]

[0028] Plating process conditions: the pulse width of single pulse square wave current is 0.5ms, the duty cycle is 30%, and the average current density is 0.5A / dm 2 ; The pH is 11, the temperature is 70°C, and the electroplating time is 40min.

Embodiment 2

[0030] The formulation of the electroplating solution is as follows:

[0031]

[0032] Plating process conditions: the pulse width of single pulse square wave current is 0.6ms, the duty cycle is 25%, and the average current density is 0.8A / dm 2 ; The pH is 13, the temperature is 80° C., and the electroplating time is 35 minutes.

Embodiment 3

[0034] The formulation of the electroplating solution is as follows:

[0035]

[0036]

[0037] Plating process conditions: the pulse width of single pulse square wave current is 0.8ms, the duty cycle is 20%, and the average current density is 3A / dm 2 ; The pH is 12, the temperature is 70°C, and the electroplating time is 20min.

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Abstract

The invention discloses an alkaline P salt plating solution for electroplating platinum and an electroplating method thereof. In terms of platinum, the plating solution comprises 20-30g / L p salt, 90-110g / L ammonium nitrate, 8-12g / L potassium nitrite or sodium nitrite and 100-300mg / L sodium glutamate. The ammonium nitrate and the potassium nitrite or sodium are taken as auxiliary salts, and the sodium glutamate is taken as a brightening agent, so that the obtained plating solution has better dispersion force and deep plating cavity, high cathode current efficiency and excellent plating solution performance. A plating layer obtained by electroplating through the plating solution under an alkaline condition has low porosity, high brightness and good plating quality.

Description

technical field [0001] The invention relates to the technical field of electroplating platinum, in particular to an alkaline P-salt plating solution for electroplating platinum and an electroplating method thereof. Background technique [0002] Platinum has superior properties and is widely used. In the jewelry industry, it is mainly used as decorations and handicrafts. In the chemical industry, it is used to manufacture advanced chemical vessels, platinum crucibles, electrodes and catalysts to accelerate chemical reactions. Platinum-iridium alloy is the material from which fountain pen nibs are made. Especially in the automobile industry, platinum plays an irreplaceable role in exhaust gas treatment, and its consumption accounts for almost half of the platinum industry's consumption. because. However, platinum resources are scarce and expensive, which restricts the application of platinum electrodes. Therefore, platinum-plated materials are used to replace pure platinum...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C25D3/50C25D5/18C25D5/20
Inventor 唐靖岚
Owner WUXI QINGYANG MACHINERY MFG
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