Al technical title is built by PatSnap Al team. It summarizes the technical point description of the patent document.
A super-resolution imaging, a part of the technology, applied in the direction of material excitation analysis, fluorescence/phosphorescence, etc., can solve the problem of uneven distribution of refractive index, achieve the effect of aberration correction and improve spatial resolution
Inactive Publication Date: 2017-12-29
SHENZHEN UNIV
View PDF10 Cites 0 Cited by
Summary
Abstract
Description
Claims
Application Information
AI Technical Summary
This helps you quickly interpret patents by identifying the three key elements:
Problems solved by technology
Method used
Benefits of technology
Problems solved by technology
[0005] Aiming at the defects of the prior art, the purpose of the present invention is to use coherent optical adaptive optics technology (CoherentOptical Adaptive Technique, COAT) to carry out aberration correction to improve the spatial resolution of the STED super-resolution microscopy imaging system, aiming to solve the problem caused by the biological sample surface The aberrations caused by the unevenness of the sample and the uneven distribution of the refractive index in the sample
Method used
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more
Image
Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
Click on the blue label to locate the original text in one second.
Reading with bidirectional positioning of images and text.
Smart Image
Examples
Experimental program
Comparison scheme
Effect test
Embodiment Construction
[0019] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described here are only used to explain the present invention, not to limit the present invention.
[0020] A method and system for improving the spatial resolution of STED super-resolution imaging provided by the present invention belong to a stimulated emission depletion (STED) super-resolution microscopic imaging system and a new method for improving the spatial resolution of the system, which can solve the problem of existing super-resolution imaging When the system is imaging deep biological cells, the image quality is poor due to aberration.
[0021] The embodiment of the present invention is achieved in this way, a super-resolution imaging system, comprising:
[0022] A femtosecond laser (...
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more
PUM
Property
Measurement
Unit
angle of incidence
aaaaa
aaaaa
Login to view more
Abstract
The invention discloses a super-resolution imaging system, comprising a first laser, a second laser, a first half-wave plate, a first pulse beam splitter, a spectrometer, a first lens group, a glass rod, a polarization-maintaining optical fiber, and a spatial light modulation Device, first objective lens, reflector group, second lens group, reflector, single-mode fiber, second half-wave plate, retroreflector, reflector, first dichroic mirror, second dichroic mirror, scanning system, four One-fifth of the glass slide, space objective lens, second pulse splitter and photomultiplier tube, use coherent adaptive optics technology for aberration correction to improve the spatial resolution of the STED super-resolution microscopy imaging system, and solve the problems caused by the biological sample surface The aberrations caused by the unevenness of the sample and the uneven distribution of the refractive index in the sample; the spatial resolution is improved.
Description
technical field [0001] The invention belongs to the field of optical microscopic imaging, and more specifically relates to a method and system for improving the spatial resolution of stimulated emission depletion (Stimulated Emission Depletion, STED) super-resolution microscopic imaging. Background technique [0002] In a conventional optical microscopic imaging system, due to the diffraction effect of optical components, the light spot formed on the sample after the parallel incident illumination light is focused by the microscopic objective lens is not an ideal spot, but a spot with a certain size. Diffraction spot, according to Abbe's law proposed by German physicist Ernst-Abbe, the diameter of the smallest spot that visible light can focus is one-third of the wavelength of the light wave, about 200nm. In 1994, German scientist S.W.Hell first proposed STED super-resolution microscopy imaging technology, which surpassed the diffraction limit and achieved a spatial resoluti...
Claims
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more
Application Information
Patent Timeline
Application Date:The date an application was filed.
Publication Date:The date a patent or application was officially published.
First Publication Date:The earliest publication date of a patent with the same application number.
Issue Date:Publication date of the patent grant document.
PCT Entry Date:The Entry date of PCT National Phase.
Estimated Expiry Date:The statutory expiry date of a patent right according to the Patent Law, and it is the longest term of protection that the patent right can achieve without the termination of the patent right due to other reasons(Term extension factor has been taken into account ).
Invalid Date:Actual expiry date is based on effective date or publication date of legal transaction data of invalid patent.