Method for preparing ni-mn-co-in alloy film by laser pulse sputtering deposition
A ni-mn-co-in, sputtering deposition technology, applied in the field of metal alloys, can solve the problems of unstable performance, low composition uniformity, poor toughness, etc., and achieve the effect of precise composition, abundant reserves and high strength
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Embodiment 1
[0026] Take three kinds of metal elements with purity of 99.99at.%-Ni, 99.95at.%-Mn, and 99.99at.%-In as target materials, and take 50 parts of Ni, 34 parts of Mn, and 16 parts of The In is put into a vacuum non-consumable electrode electric arc furnace for smelting, and the furnace chamber is evacuated before smelting, and the vacuum degree reaches 5×10 -3Pa, filled with Ar protective gas. In order to make the composition of the material uniform, the material is turned over by a manipulator before each smelting, and the smelting is turned over at least 4 times, and magnetic stirring is added during the smelting process. After smelting, an ingot with a diameter of 50 mm was obtained. After being ground on the grinding wheel, the ingot was placed on a wire electric discharge machine and cut into a circular target with a diameter of 3mm×2mm. Quartz glass with a size of 30mm×30mm×3mm is selected as the substrate of the thin film. Pretreatment of the quartz glass substrate: was...
Embodiment 2
[0028] Take four metal elements with a purity of 99.99at.%-Ni, 99.95at.%-Mn, 99.99at.%-In and 99.95at.%-Co as target materials, and take 50 parts of Ni, 34 parts of Mn, 14 parts of In and 2 parts of Co are melted in a vacuum non-consumable electrode electric arc furnace. -3 Pa, filled with Ar protective gas. In order to make the composition of the material uniform, the material is turned over by a manipulator before each smelting, and the smelting is turned over at least 4 times, and magnetic stirring is added during the smelting process. After smelting, an ingot with a diameter of 50 mm was obtained. After being ground on the grinding wheel, the ingot is placed on a wire electric discharge machine and cut into a circular target with a diameter of 3mm×2mm. Quartz glass with a specification of 30mm×30mm×3mm is selected as the substrate of the thin film. Pretreatment of the quartz glass substrate: washing the quartz glass substrate with deionized water, then ultrasonicating i...
Embodiment 3
[0030] Take four metal elements with a purity of 99.99at.%-Ni, 99.95at.%-Mn, 99.99at.%-In and 99.95at.%-Co as target materials, and take 50 parts of Ni, 34 parts of Mn, 12 parts of In and 4 parts of Co are melted in a vacuum non-consumable electrode electric arc furnace. -3 Pa, filled with Ar protective gas. In order to make the composition of the material uniform, the material is turned over by a manipulator before each smelting, and the smelting is turned over at least 4 times, and magnetic stirring is added during the smelting process. After smelting, an ingot with a diameter of 50 mm was obtained. After being ground on the grinding wheel, the ingot is placed on a wire electric discharge machine and cut into a circular target with a diameter of 3mm×2mm. Quartz glass with a specification of 30mm×30mm×3mm is selected as the substrate of the thin film. Pretreatment of the quartz glass substrate: washing the quartz glass substrate with deionized water, then ultrasonicating i...
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