Method for preparing ni-mn-co-in alloy film by laser pulse sputtering deposition

A ni-mn-co-in, sputtering deposition technology, applied in the field of metal alloys, can solve the problems of unstable performance, low composition uniformity, poor toughness, etc., and achieve the effect of precise composition, abundant reserves and high strength

Active Publication Date: 2018-07-06
DALIAN UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0005] The present invention provides a method for preparing a Ni-Mn-Co-In ferromagnetic shape memory alloy thin film in order to solve the problems of poor toughness, low component uniformity and unstable performance of the existing ferromagnetic shape memory alloy bulk material

Method used

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  • Method for preparing ni-mn-co-in alloy film by laser pulse sputtering deposition
  • Method for preparing ni-mn-co-in alloy film by laser pulse sputtering deposition
  • Method for preparing ni-mn-co-in alloy film by laser pulse sputtering deposition

Examples

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Embodiment 1

[0026] Take three kinds of metal elements with purity of 99.99at.%-Ni, 99.95at.%-Mn, and 99.99at.%-In as target materials, and take 50 parts of Ni, 34 parts of Mn, and 16 parts of The In is put into a vacuum non-consumable electrode electric arc furnace for smelting, and the furnace chamber is evacuated before smelting, and the vacuum degree reaches 5×10 -3Pa, filled with Ar protective gas. In order to make the composition of the material uniform, the material is turned over by a manipulator before each smelting, and the smelting is turned over at least 4 times, and magnetic stirring is added during the smelting process. After smelting, an ingot with a diameter of 50 mm was obtained. After being ground on the grinding wheel, the ingot was placed on a wire electric discharge machine and cut into a circular target with a diameter of 3mm×2mm. Quartz glass with a size of 30mm×30mm×3mm is selected as the substrate of the thin film. Pretreatment of the quartz glass substrate: was...

Embodiment 2

[0028] Take four metal elements with a purity of 99.99at.%-Ni, 99.95at.%-Mn, 99.99at.%-In and 99.95at.%-Co as target materials, and take 50 parts of Ni, 34 parts of Mn, 14 parts of In and 2 parts of Co are melted in a vacuum non-consumable electrode electric arc furnace. -3 Pa, filled with Ar protective gas. In order to make the composition of the material uniform, the material is turned over by a manipulator before each smelting, and the smelting is turned over at least 4 times, and magnetic stirring is added during the smelting process. After smelting, an ingot with a diameter of 50 mm was obtained. After being ground on the grinding wheel, the ingot is placed on a wire electric discharge machine and cut into a circular target with a diameter of 3mm×2mm. Quartz glass with a specification of 30mm×30mm×3mm is selected as the substrate of the thin film. Pretreatment of the quartz glass substrate: washing the quartz glass substrate with deionized water, then ultrasonicating i...

Embodiment 3

[0030] Take four metal elements with a purity of 99.99at.%-Ni, 99.95at.%-Mn, 99.99at.%-In and 99.95at.%-Co as target materials, and take 50 parts of Ni, 34 parts of Mn, 12 parts of In and 4 parts of Co are melted in a vacuum non-consumable electrode electric arc furnace. -3 Pa, filled with Ar protective gas. In order to make the composition of the material uniform, the material is turned over by a manipulator before each smelting, and the smelting is turned over at least 4 times, and magnetic stirring is added during the smelting process. After smelting, an ingot with a diameter of 50 mm was obtained. After being ground on the grinding wheel, the ingot is placed on a wire electric discharge machine and cut into a circular target with a diameter of 3mm×2mm. Quartz glass with a specification of 30mm×30mm×3mm is selected as the substrate of the thin film. Pretreatment of the quartz glass substrate: washing the quartz glass substrate with deionized water, then ultrasonicating i...

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Abstract

The invention provides a method for preparing a Ni-Mn-Co-In alloy film by laser pulse sputtering deposition. A structure formula of an alloy film is Ni50Mn34In16-XCoX, wherein x is 0, 2, 4 or 6; the film is prepared by the following method: metal elementary substances of Ni, Mn, Co and In are taken as target raw materials in proportion; the target raw materials are put in a non-self-consumption vacuum arc furnace for smelting; after the arc furnace is vacuumized to 5*10-3 Pa, shielding gas is filled in to obtain a circular target; a substrate and a target are put in a vacuum system after pretreatment for vacuumizing to 1.0*10-4 Pa; the temperature of the substrate is 500-700 DEG C; the distance between the substrate and the target is 3-5 cm; then, a laser is used for emitting laser; the control frequency is 3-4 Hz; the sputtering is performed for 1-3 hours to obtain a film with a demanded thickness; and finally, the film is annealed for 0.5-3 h at a temperature of 800-900 DEG C to prepare a Ni50Mn34In16-XCoX alloy film. The prepared alloy film is more precise in component, lower in roughness, strong in anisotropy, excellent in toughness, high in strength, simple in preparation process, low in cost and easy to be industrially produced.

Description

technical field [0001] The invention belongs to the technical field of metal alloys, and relates to a method for preparing a ferromagnetic shape memory alloy film, in particular to a method for preparing a Ni-Mn-Co-In alloy film by laser pulse sputtering deposition. Background technique [0002] Magnetically actuated shape memory alloys are a new class of shape memory materials, which not only have the shape memory effect of traditional shape memory alloys controlled by the temperature field, but also produce large strains under the action of a magnetic field. The discovered magnetic drive memory alloys mainly include Ni-Mn-Ga(Al), Ni-Fe-Ga, Co-Ni-Ga(Al) and Ni-Mn-X (X=In, Sn, Sb) alloys. Among them, the Ni-Mn-X series alloy is a new type of magnetically driven shape memory alloy developed in recent years. The Ni-Mn-In alloy still has a thermoelastic martensitic transformation when it deviates from the Heulser stoichiometric ratio, and a magnetic field-driven reverse marten...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/18C23C14/34
Inventor 董桂馥
Owner DALIAN UNIV
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