Moving magnetic steel gas-magnetism combined air-suspension double-workpiece-stage vector circular-arc exchange method and device based on planar grating measurement

Abstract

The invention provides a moving magnetic steel gas-magnetism combined air-suspension double-workpiece-stage vector circular-arc exchange method and device based on planar grating measurement and belongs to a semiconductor manufacturing equipment technology. The device comprises a supporting frame, a balance mass block, gas-magnetism combined air-suspension workpiece stages, workpiece stage measurement devices, workpiece stage driving devices and sensor signal transmission devices, wherein the two workpiece stages work between a measurement position and an exposure position, the positions of the workpiece stages are measured by adopting a plane grating, motion compensation is conducted on the balance mass block by adopting a passive compensation structure consisting of plane leaf springs and electromagnetic dampers, the workpiece stages are driven by adopting air suspension and planar motors, and the planar motors are adopted to drive the two workpiece stages to achieve quick single-beat arc stage exchange in the double-workpiece-stage exchange process. The problems of large beat number, long trajectories, multiple start-stop links, long stabilization time and the like of an existing stage exchange scheme are solved, stage exchange links are decreased, the stage exchange time is shortened, and the productive rate of a photo-etching machine is improved.

Description

technical field [0001] The invention belongs to the technical field of semiconductor manufacturing equipment, and mainly relates to a method and a device for measuring a moving magnetic steel gas-magnetism combined with an air-flotation double workpiece table vector arc return conversion table based on a plane grating. Background technique [0002] Lithography machine is one of the important ultra-precision equipment in the manufacture of very large scale integrated circuits. As the key subsystem of the lithography machine, the workpiece table largely determines the resolution, overlay accuracy and productivity of the lithography machine. [0003] Productivity is one of the main goals of lithography machine development. Under the condition of satisfying the resolution and overlay accuracy, improving the operating efficiency of the workpiece table and thus improving the productivity of the lithography machine is the development direction of the workpiece table technology. T...

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Problems solved by technology

However, the transposition of the workpiece table by rotating the entire base has problems such as large moment of inertia, difficulty in precise positioning of high-power rotary motors, and high heat generation that cause system temperature rise. At the same time, the radius of gyration is large, which significantly increases the structure of the main body of the lithography machine.

Chinese patent CN102495528 adopts a rotary transfer table in the center of the abutment to complete the exchange of double workpiece tables. The table change is divided into three beats, which improves the efficiency of the ta

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