Directed self-assembly method for block copolymers with laser

A technology of block copolymer and directional self-assembly, which is applied in the direction of photolithography process exposure device, optics, optomechanical equipment, etc., can solve the problems of pattern edge shape not meeting process requirements, inaccurate position of self-assembled block copolymer, etc. , to achieve the effect of clear edge lines

Active Publication Date: 2016-03-30
SEMICON MFG INT (SHANGHAI) CORP
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Problems solved by technology

[0014] In view of the above-mentioned shortcomings of the prior art, the object of the present invention is to provide a method for using laser-directed self-assembled block copolymers to solve the problem of self-assembled block copolymers formed by chemically guided methods in the prior art. The position is not accurate and the edge shape of the pattern does not meet the process requirements

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  • Directed self-assembly method for block copolymers with laser
  • Directed self-assembly method for block copolymers with laser
  • Directed self-assembly method for block copolymers with laser

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Embodiment Construction

[0042] Embodiments of the present invention are described below through specific examples, and those skilled in the art can easily understand other advantages and effects of the present invention from the content disclosed in this specification. The present invention can also be implemented or applied through other different specific implementation modes, and various modifications or changes can be made to the details in this specification based on different viewpoints and applications without departing from the spirit of the present invention.

[0043] Please refer to attached picture. It should be noted that the diagrams provided in this embodiment are only schematically illustrating the basic idea of ​​the present invention, and only the components related to the present invention are shown in the diagrams rather than the number, shape and shape of the components in actual implementation. Dimensional drawing, the type, quantity and proportion of each component can be change...

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Abstract

The invention provides a directed self-assembly method for block copolymers with laser. The method comprises the following steps: a substrate with a block copolymer layer deposited on one surface is provided, wherein the block copolymers comprise two different kinds of block molecules; laser is irradiated on the surface of the block copolymers through a photomask for forming a laser power distribution, the position with the highest light intensity is the point with the lowest potential energy, block molecules which resonate with laser frequency in the block copolymers are captured by the point with the lowest potential energy, so that the two different kinds of block molecules are guided for carrying out a periodically ordered arrangement, and a directed self-assembly pattern is formed. The directed self-assembly method for block copolymers with laser belongs to a physical method, the laser irradiation generates an extremely strong binding effect for one kind of the block molecules, so that the directed ordered arrangement at regular intervals of the two kinds of block molecules of the block copolymers are carried out, and the edge lines of the self-assembly pattern are clear without burr, bending and defect.

Description

technical field [0001] The invention belongs to the technical field of semiconductor manufacturing, and relates to a semiconductor manufacturing method, in particular to a method for using laser oriented self-assembled block copolymers. Background technique [0002] With the development of semiconductor technology, the existing photolithography technology cannot adapt to the fabrication of structures on the nanometer scale. Self-assembled membranes with self-assembly (self-assembly, SA) characteristics are divided into self-assembled monolayer membranes (self-assembly monolayer, SAM) and layer-by-layer self-assembled membranes (Layerbylayerselfassembledmembrane) according to their film-forming mechanism. The research in the field of molecular self-assembly is mainly aimed at the combination of liquid crystal polymers, block copolymers, polymers capable of forming bonds or hydrogen bonds, and systems with opposite charges. Among them, the SAM of block copolymers is nanometer-...

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/00C08L53/00G03F7/20
Inventor 刘洋刘畅
Owner SEMICON MFG INT (SHANGHAI) CORP
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