Lateral insulated gate bipolar device with double trench high voltage shielding and its preparation method
A technology of bipolar devices and double grooves, which is applied in semiconductor/solid-state device manufacturing, semiconductor devices, electrical components, etc., can solve problems such as withstand voltage reduction, achieve reduced withstand voltage, improve dynamic avalanche suppression capability, and increase withstand voltage Effect
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[0025] Combine below figure 2 , the present invention is described in detail, a lateral insulated gate bipolar device with a novel double-groove high-voltage interconnection shielding structure, comprising: a P-type substrate 1, a buried oxide layer 2 is arranged on the P-type substrate 1, An N-type epitaxial layer 3 is arranged on the buried oxide layer 2, a P-type body region 4 and an N-type buffer layer 5 are arranged in the N-type epitaxial layer 3, and an N-type emitter 6 and an N-type emitter are arranged in the P-type body region 4. The P-type emitter 7 is provided with a polysilicon gate 13 above the N-type emitter 6, and a metal 18 is provided on the polysilicon gate 13 to connect the polysilicon gate 13 to the input\output 16 on the periphery of the structure. The collector electrode 8, the polysilicon field plate 14 above the N-type buffer layer 5, the polysilicon field plate 14 is connected to the input\output 15 on the periphery of the structure by the collector ...
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