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Lateral insulated gate bipolar device with double trench high voltage shielding and its preparation method

A technology of bipolar devices and double grooves, which is applied in semiconductor/solid-state device manufacturing, semiconductor devices, electrical components, etc., can solve problems such as withstand voltage reduction, achieve reduced withstand voltage, improve dynamic avalanche suppression capability, and increase withstand voltage Effect

Active Publication Date: 2018-06-19
SOUTHEAST UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Aiming at the problem of reduced withstand voltage caused by high-voltage interconnection lines, the present invention proposes a new type of shielding structure for high-voltage interconnection lines, which greatly improves the withstand voltage under the high-voltage interconnection lines and improves the reliability of the entire high-voltage integrated circuit

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  • Lateral insulated gate bipolar device with double trench high voltage shielding and its preparation method
  • Lateral insulated gate bipolar device with double trench high voltage shielding and its preparation method
  • Lateral insulated gate bipolar device with double trench high voltage shielding and its preparation method

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Embodiment Construction

[0025] Combine below figure 2 , the present invention is described in detail, a lateral insulated gate bipolar device with a novel double-groove high-voltage interconnection shielding structure, comprising: a P-type substrate 1, a buried oxide layer 2 is arranged on the P-type substrate 1, An N-type epitaxial layer 3 is arranged on the buried oxide layer 2, a P-type body region 4 and an N-type buffer layer 5 are arranged in the N-type epitaxial layer 3, and an N-type emitter 6 and an N-type emitter are arranged in the P-type body region 4. The P-type emitter 7 is provided with a polysilicon gate 13 above the N-type emitter 6, and a metal 18 is provided on the polysilicon gate 13 to connect the polysilicon gate 13 to the input\output 16 on the periphery of the structure. The collector electrode 8, the polysilicon field plate 14 above the N-type buffer layer 5, the polysilicon field plate 14 is connected to the input\output 15 on the periphery of the structure by the collector ...

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Abstract

A double-trench high-voltage shielded lateral insulated-gate bipolar device and a preparation method thereof are provided. The bipolar device comprises a P-type substrate, a buried oxide layer, and an N-type epitaxial layer. A P-type body region and an N-type buffer layer are disposed in the N-type epitaxial layer. A P-type emitter and an N-type emitter are disposed in the P-type body region. A polysilicon gate is arranged over the N-type emitter and is provided with metal which connect the polysilicon gate to a structure peripheral input / output. A P-type collector is disposed in the N-type buffer layer. A polysilicon field plate is disposed over the N-type buffer layer and is connected with gate metal. Three sides of the P-type body region are surrounded by the N-type buffer layer but the other side of the P-type body region is not. The P-type collector is a collector metallic connection line. A trench is arranged under the collector metallic connection line and close to a structure edge and is doped with a dielectric. The entire structure is surrounded by the trench doped with the dielectric. The bottom of the trench of the high-voltage interconnection line shielding structure is not in contact with the buried oxide layer and a gap is provided.

Description

technical field [0001] The invention mainly relates to the technical field of power integrated circuits, specifically, it is especially suitable for many power control and processing fields such as switching power supplies, motor control, automotive electronic systems, and household appliances. Background technique [0002] High-voltage power integration technology is the product of the combination of VLSI and power devices. The high-voltage integrated circuit integrating low-voltage control circuit and high-voltage power element on the same chip greatly reduces the number of electronic components required by the electronic system, thereby reducing system cost, reducing equipment size, and improving system reliability. [0003] High-voltage integrated circuits have been widely used in a wide range of fields including electronic lighting, motor drive, power management, industrial control, and display drive. The development and application of high-voltage integrated circuits ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L29/06H01L29/40H01L29/739H01L21/331
CPCH01L29/0623H01L29/0634H01L29/404H01L29/66325H01L29/7394
Inventor 祝靖黄超张龙卜爱国孙伟锋陆生礼时龙兴
Owner SOUTHEAST UNIV