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Six-dimensional rapid high-precision alignment and measurement system based on zone plate

A measurement system and strip technology, applied in the field of precision instruments, can solve problems such as unfavorable operation and large judgment deviation, and achieve the effect of avoiding multi-dimensional independent measurement

Active Publication Date: 2016-06-01
WUHAN UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The problem is that the independent measurement results of each degree of freedom lack the coupling information between the degrees of freedom or the coupling relationship is judged to be too biased in the analysis, and even the execution of actions based on this judgment may become an unfavorable operation

Method used

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  • Six-dimensional rapid high-precision alignment and measurement system based on zone plate
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  • Six-dimensional rapid high-precision alignment and measurement system based on zone plate

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Embodiment Construction

[0021] The present invention will be further described below in conjunction with accompanying drawing and specific embodiment:

[0022] Such as figure 1 As shown, the present invention includes a two-dimensional zone plate 3, a collimated laser light source (realized by a light source 1 and a collimator lens 2, the laser wavelength corresponds to the zone plate design, and the laser light exit port and optical filter and collimation The lens is connected to obtain collimated light, and the collimated light illuminates the two-dimensional zone plate vertically), the light intensity adjustment device, and the probe array 5 composed of at least 4 photoelectric sensing probes (which can be four-quadrant diodes, photodiodes, CCD cameras, COMS camera, which can be sensitive to changes in the intensity of light), a special target panel, a control circuit, a support bracket, a photoelectric sensor probe fixed on the target panel, and a two-dimensional wave zone plate located between t...

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Abstract

The invention discloses a six-dimensional rapid high-precision alignment and measurement system based on a zone plate. The six-dimensional rapid high-precision alignment and measurement system based on the zone plate is capable of achieving rapid high-precision spatial reset alignment and measurement. Six-dimensional high-precision alignment is spatial attitude positioning actually, and synchronous measurement in six degrees of freedom is extremely difficult. For instance, currently, according to a latest-generation lithography machine of Advanced Semiconductor Material Lithography in Netherlands, two same-type two-dimensional gratings are used for (two-dimensional) alignment for resetting between a wafer and a projection lens, the direction perpendicular to the grating surfaces is positioned through measurement by laser interferometry, and accordingly a step-by-step detection and adjustment process is required and complicated position relation calibration and coordinated movement between two kinds of measurement are required. As another alignment system and scheme, the six-dimensional rapid high-precision alignment and measurement system based on the zone plate is capable of achieving six-dimensional high-precision alignment and measurement simultaneously and synchronously.

Description

technical field [0001] The invention belongs to the field of precision instruments, in particular to an alignment measurement system, which is especially suitable for systems requiring precise positioning and alignment of spatial attitude. Background technique [0002] The precise and fast positioning and alignment of spatial attitude has a wide range of applications, such as the relative positional relationship between the mask plate, projection lens, and wafer in the lithography machine, and the motion feedback control of precision machine tools. However, there are still few solutions that can meet this requirement in the current measurement methods, and some existing methods are still in the state of gradual improvement. The difficulty lies in the lack of a solution or means of sensing method that can respond sensitively enough to all six degrees of freedom. For example, the patent of ASML's latest generation lithography machine in the Netherlands currently uses two 2D g...

Claims

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Application Information

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IPC IPC(8): G01C15/00
CPCG01C15/002
Inventor 戴宜全桂成群刘胜雷金
Owner WUHAN UNIV
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