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Hydro-thermal preparation method for cerium oxide and application of cerium oxide in chemical-mechanical polishing

A technology of cerium oxide and cerium hydroxide, applied in the field of CMP polishing application, can solve the problem of less cerium oxide nanomaterials and the like

Inactive Publication Date: 2016-07-27
ANJI MICROELECTRONICS TECH (SHANGHAI) CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

At present, there are few reports on the direct synthesis of cerium oxide nanomaterials by hydrothermal method.

Method used

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  • Hydro-thermal preparation method for cerium oxide and application of cerium oxide in chemical-mechanical polishing

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Experimental program
Comparison scheme
Effect test

Embodiment 1

[0019] At room temperature, prepare 0.05M cerium nitrate, 0.05MH 2 o 2 and 0.05M ammonium hydroxide aqueous solution, slowly add the ammonium hydroxide aqueous solution to the cerium nitrate aqueous solution, the precipitation reaction temperature is 30 ° C, when the pH value of the mixed precipitation slurry reaches 7.0, stop adding the precipitant ammonium hydroxide; the configured h 2 o 2 Added to the above precipitation slurry, H 2 o 2 The molar ratio to the cerium ion in the reaction system is 1.5 / 1.0, and keep stirring for 30 minutes after the addition is completed; after the obtained precipitated slurry is suction filtered and washed 3 times, the pH value of the mixed system is adjusted to 2.0 with nitric acid, and heated at 120°C The hydrothermal crystallization reaction was carried out for 10 hours, and the cerium oxide dispersion slurry was obtained after cooling, which can be further applied to the cerium oxide abrasive for STI polishing.

Embodiment 2

[0021] At room temperature, prepare 1.0M cerium nitrate, 1.0MH 2 o 2 and 1.0M sodium hydroxide aqueous solution, slowly add the sodium hydroxide aqueous solution to the cerium nitrate solution, the precipitation reaction temperature is 90 ° C, when the pH value of the mixed precipitation slurry reaches 10.0, stop adding the precipitant sodium hydroxide; the configured h 2 o 2 Added to the above precipitation slurry, H 2 o 2 The molar ratio to the cerium ion in the reaction system is 2.0 / 1.0, and keep stirring for 30 minutes after the addition is completed; after the obtained precipitated slurry is suction filtered and washed 3 times, the pH value of the mixed system is adjusted to 2.0 with nitric acid, and heated at 180°C The hydrothermal crystallization reaction was carried out for 8.0 hours, and the cerium oxide dispersion slurry was obtained after cooling, which can be further applied to the cerium oxide abrasive for STI polishing.

Embodiment 3

[0023] At room temperature, prepare 0.5M cerium nitrate, 0.5MAPS and 0.5MTMAH aqueous solutions respectively, slowly add the TMAH aqueous solution to the cerium nitrate solution, the precipitation reaction temperature is 80°C, when the pH value of the mixed precipitation slurry reaches 8.5, stop adding the precipitation Add the prepared APS to the above precipitation slurry, the molar ratio of APS to cerium ions in the reaction system is 2.0 / 1.0, and keep stirring for 30 minutes after the addition; filter and wash the obtained precipitation slurry 3 times Finally, adjust the pH value of the mixed system to 4.0 with nitric acid, and conduct a hydrothermal crystallization reaction at 200°C for 0.5 hours. After cooling, a cerium oxide dispersion slurry can be obtained, which can be further applied to cerium oxide abrasives for STI polishing.

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PUM

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Abstract

The invention discloses a preparation method for cerium oxide. The preparation method comprises the following steps: step 1, mixing a precipitating agent, a cerium source and an oxidizing agent, wherein the precipitating agent is added into a solution of the cerium source while stirring at first, then addition of the precipitating agent is stopped when the pH value of precipitate mixed liquor reaches 7.0 to 10.0, and then adding a solution of the oxidizing agent into the precipitate mixed liquor for precipitation so as to obtain cerium hydroxide; and step 2, subjecting cerium hydroxide to hydro-thermal synthesis reaction so as to prepare cerium oxide particles. The cerium oxide synthesized in the invention does not need other special treatment, has good dispersibility and polishing activity and can be used as an abrasive for STI polishing.

Description

technical field [0001] The invention discloses a hydrothermal preparation method of cerium oxide and its application in CMP polishing. Background technique [0002] At present, there have been a lot of reports on the application of cerium oxide as an abrasive in the polishing of shallow trench isolation (STI) process (such as patents 201310495424.5, 200510069987.3). This is mainly due to its high polishing activity on silica, and it can achieve high polishing effect at a low solid content. Therefore, chemical mechanical polishing fluids using cerium oxide as abrasives have greater application prospects and market advantages compared with traditional silicon oxide or aluminum oxide materials in terms of performance and cost. [0003] When cerium oxide is used as an abrasive, its own particle characteristics are very important to the polishing effect. For example, in the application of STI polishing, it has been reported in the literature that the particle size and morpholog...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C01F17/00C09G1/02
Inventor 尹先升贾长征房庆华周仁杰王雨春
Owner ANJI MICROELECTRONICS TECH (SHANGHAI) CO LTD
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