A Pattern Electroplating Method for Integrating Two Square Resistive Thin Film Circuits on the Same Plane of the Dielectric Substrate
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- THE 41ST INST OF CHINA ELECTRONICS TECH GRP
- Publication Date
- 2019-01-18
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Abstract
Description
technical field
[0001] The invention relates to the technical field of manufacturing microwave and millimeter wave thin film circuits, in particular to a pattern electroplating method for integrating two square resistance thin film circuits on the same plane of a dielectric substrate. Background technique
[0002] An electric field radiation broadband detector based on distributed thin film resistance loading is suitable for radio frequency broadband electric field radiation detection in the near and far field full space area. The scheme adopts electric small probes loaded with distributed thin-film resistors to receive broadband electric field radiation, and then detects electric field radiation through high-sensitivity low-barrier Schottky diodes, and passes the detection signal through a low Pass filter RF signal isolation, so as to achieve the purpose of low distortion output. Electric field radiation broadband detector based on distributed thin film resistance loading,...