Full-automatic pulse spraying device and method used for preparing thin film

A spraying device, fully automatic technology, applied in the direction of spraying device, liquid spraying device, device for coating liquid on the surface, etc., can solve the problems that the surface of the film is not easy to be uniform, unfavorable for large-area preparation, and detrimental to human health. The effect of low, controllable thickness and convenient operation

Active Publication Date: 2016-10-12
HEBEI UNIVERSITY
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

At present, the most efficient method is the solution particle method based on hydrazine, which shows that the non-vacuum method has some incomparable advantages in the preparation of CZTSSe thin films, but hydrazine is a toxic solvent, which is harmful to human health.
The film prepared by the sol-gel method is too thin, and often requires multiple spin coatings to obtain the required film thickness, and the surface of the film is not easy to be uniform after multiple spin coatings, and the thickness cannot be controlled, which is not conducive to large-area preparation.

Method used

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  • Full-automatic pulse spraying device and method used for preparing thin film
  • Full-automatic pulse spraying device and method used for preparing thin film
  • Full-automatic pulse spraying device and method used for preparing thin film

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Embodiment Construction

[0036] Such as figure 1 As shown, the fully automatic pulse spraying device for preparing thin films provided by the present invention includes a spray gun 1 , a container 2 , an air pump 3 , a controller 4 and a heating plate 5 .

[0037] The spray gun 1 is vertically arranged on a movable support. The main part of the spray gun 1 is a hollow gun body, and the lower end of the gun body is a nozzle. The container 2 is also arranged on the movable support, and the container 2 is located above the spray gun 1 . The container 2 is filled with a precursor liquid used to prepare a thin film. The bottom end of the container 2 is connected to one end of the liquid guide tube 7 (ie, the liquid inlet), and the other end of the liquid guide tube 7 (ie, the liquid outlet) extends into the gun body of the spray gun 1 . The pressure in the container 2 is equivalent to the pressure in the gun body of the spray gun 1. Under natural conditions, the precursor liquid in the container 2 will ...

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Abstract

The invention provides a full-automatic pulse spraying device and method used for preparing a thin film. The full-automatic pulse spraying device comprises a spray gun, a gas pump, a controller, a container and a heating plate. The spray gun is vertically placed. A gun body is arranged on the upper portion of the spray gun. A spray nozzle is arranged at the lower end of the spray gun. The gas pump is connected with the gun body of the spray gun through a gas guide pipe and used for providing high-pressure work gas into the gun body of the spray gun. A gas valve switch is arranged on the gas guide pipe. The controller is used for controlling the gas valve switch to be turned on and turned off so as to control the gas pump to provide the high-pressure work gas into the gun body of the spray gun. The container is used for containing precursor liquid. The heating plate is used for heating a substrate on the heating plate. Under the effect of the high-pressure work gas, the precursor liquid in the container can enter the gun body of the spray gun through a liquid guide pipe and is atomized, and finally the precursor liquid is sprayed on the high-temperature substrate through the spray nozzle. The full-automatic pulse spraying device can automatically run and stop by itself once all parameters are well set, the full-automatic pulse spraying device is convenient to use, efficient and easy to operate, and the thin film which is large in area, controllable in thickness, uniform and compact can be prepared.

Description

technical field [0001] The invention relates to the technical field of thin film preparation, in particular to a fully automatic pulse spraying device and a spraying method for preparing thin films. Background technique [0002] Copper zinc tin sulfur selenide (Cu 2 ZnSn(S 1-x Se x ) 4 , abbreviation: CZTSSe) has attracted increasing attention due to its excellent properties such as environmental friendliness, rich crustal content, and good photoelectric performance. The band gap of CZTSSe is 1.5 eV, which is consistent with the optimal band gap required by semiconductor solar cells, and it is a direct band gap semiconductor with a large light absorption coefficient (>10 4 cm -1 ), so the thickness of the CZTSSe absorber layer required in the solar cell is small, which greatly reduces the size of the module. Due to its many excellent characteristics, in just a few years, CZTSSe thin film photovoltaic technology has developed rapidly, and the photoelectric conversion...

Claims

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Application Information

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Patent Type & AuthorityApplications(China)
IPC IPC(8): B05B7/04B05B13/02B05B7/12B05D1/02B05D3/02B05D7/24
CPCB05B7/0416B05B7/1209B05B13/0278B05D1/02B05D3/0218B05D7/24
Inventor范建东麦耀华陈荣荣刘冲
OwnerHEBEI UNIVERSITY