A preparation method of continuously changing titanium-chromium metal nitride composite hard film

Abstract

The invention discloses a preparation method of a titanium-chromium metal nitride composite hard film with continuous change, and relates to a preparation method of a metal film. The method comprises the following steps of determining a deposition technique, determining an arc source target material, determining the number of arc sources, selecting and preprocessing a to-be-coated metal substrate, determining a pre-baking process, determining a pre-bombarding cleaning process, determining a preparation process of a titanium-chromium alloy transition layer, determining deposition time, controlling reaction gas partial pressure corresponding to the deposition time, determining arc source target arc current corresponding to the deposition time, determining substrate negative bias voltage corresponding to the deposition time, controlling the temperature of a coating chamber, and performing rotary coating on a workpiece frame. By using the method, the quasi-linear continuous change of film components from the metal substrate to the surface of the film is guaranteed, and the internal stress of a component difference interface in the film due to large component change is reduced, so that high adhesion, high hardness and high thermal shock property are simultaneously achieved, and good stability is obtained.

Description

technical field [0001] The invention relates to a method for preparing a metal film, in particular to a method for preparing a continuously changing metal nitride composite hard film by using multi-arc ion plating technology, such as a method for preparing a continuously changing titanium-chromium metal nitride composite hard film . Background technique [0002] Multi-arc ion plating is a physical vapor deposition technology with multiple cathode arc evaporation sources that can evaporate simultaneously. It has the remarkable characteristics of fast deposition speed, dense film structure, strong adhesion, and good uniformity. This technology is applicable to the preparation of various hard reaction films, and has been successfully applied in the preparation of nitride hard reaction films. [0003] For titanium-based nitride hard reaction films with single-layer, double-layer and gradient composition changes, there are generally the following disadvantages: 1. Obvious interf...

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Problems solved by technology

[0003] For titanium-based nitride hard reaction films with single-layer, double-layer and gradient composition changes, there are generally the following disadvantages: 1. Obvious interfaces with compositional differences are prone to appear in the film structure, resulting in film composition 2. It is easy to have a contradiction between the hardness of the film layer and the adhesion of the film layer, that is, it is difficult to satisfy the hardness and adhesion force at the same time; 3. It is easy to generate a large internal stress in the film layer, which affects the hard reaction film. The thermal shock performance will affect the use effect and service life