A kind of preparation method of metal hard film

Abstract

The invention relates to a metal film preparation method, in particular to a preparation method of a hard metal film. The method comprises the following steps of determining a deposition technology, determining an arc source target, determining the number of arc sources, carrying out selection and pretreatment of a metal matrix to be coated, determining a prebaking technology, determining a pre bombardment cleaning process, determining a preparation technology of a titanium-aluminum-chromium alloy transition layer, determining deposition time, controlling the reaction gas partial pressure corresponding to the deposition time, determining the arc current of the arc source target corresponding to the deposition time, determining the matrix negative bias corresponding to the deposition time, controlling the temperature of a coating chamber, and carrying out rotary coating with a workpiece rack. By means of the method, the quasi-linear continuous change of film compositions from the metal matrix to the surface of the film is ensured, the situation that as the compositions change drastically, internal stress is caused to the component difference interface in the film is avoided, and accordingly the effect that high adhesion, high hardness and high thermal shock are achieved simultaneously is ensured; and besides, good stability is achieved.

Description

technical field [0001] The invention relates to a method for preparing a metal nitride composite hard film, in particular to a method for preparing a metal nitride composite hard film with continuously changing composition by using a multi-arc ion plating technology, such as a method for preparing a hard film. Background technique [0002] Multi-arc ion plating is a physical vapor deposition technology with multiple cathode arc evaporation sources that can evaporate simultaneously. It has the remarkable characteristics of fast deposition speed, dense film structure, strong adhesion, and good uniformity. This technology is applicable to the preparation of various hard reaction films, and has been successfully applied in the preparation of nitride hard reaction films. [0003] For titanium-based nitride hard reaction films with single-layer, double-layer and gradient composition changes, there are generally the following disadvantages: 1. Obvious interfaces with compositional ...

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Problems solved by technology

[0003] For titanium-based nitride hard reaction films with single-layer, double-layer and gradient composition changes, there are generally the following disadvantages: 1. Obvious interfaces with compositional differences are prone to appear in the film structure, resulting in film composition 2. It is easy to have a contradiction between the hardness of the film layer and the adhesion of the film layer, that is, it is difficult to satisfy the hardness and adhesion force at the same time; 3. It is easy to generate a large internal stress in the film layer, which affects the hard reaction film. The thermal shock performance will affect the use effect and service life