A method for preparing high-purity porous silicon dioxide from waste circuit boards
A technology of porous silica and waste circuit boards, applied in the field of environmental engineering, can solve the problems of low utilization value, waste of resources, and few utilization methods, etc.
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Embodiment 1
[0015] Such as figure 1 As shown, firstly, the waste circuit board non-metallic powder is mixed with 2mol / L dilute hydrochloric acid at a solid-to-liquid ratio of 1:25g / mL, and heat pretreatment is performed at 90°C. The purpose of pretreatment is to remove waste circuit board non-metallic powder. Residual metal elements in the metal powder, pretreatment for 5 hours; filter, wash and dry the precipitate. The non-metallic powder of waste circuit board after hydrochloric acid pretreatment was subjected to subcritical water oxidation activation. The subcritical water oxidation activation process can achieve two goals: one is to decompose and remove the organic materials containing brominated flame retardants, and the other is to activate and prepare porous silica. The specific process of subcritical water oxidation activation is as follows: control the temperature of the subcritical water oxidation reactor to 250°C, the pressure to 5 MPa, and the reaction time to 30 minutes. Aft...
Embodiment 2
[0017] Such as figure 1 As shown, firstly, the waste circuit board non-metallic powder is mixed with 2mol / L dilute hydrochloric acid at a solid-to-liquid ratio of 1:25g / mL, and heat pretreatment is performed at 90°C. The purpose of pretreatment is to remove the waste circuit board non-metallic powder The residual metal elements in the solution were pretreated for 5 hours, filtered, and the precipitate was washed and dried. The non-metallic powder of waste circuit board after hydrochloric acid pretreatment was subjected to subcritical water oxidation activation. The subcritical water oxidation activation process can achieve two goals: one is to decompose and remove the organic materials containing brominated flame retardants, and the other is to activate and prepare porous silica. The specific process of subcritical water oxidation activation is as follows: control the temperature of the subcritical water oxidation reactor to 300°C, the pressure to 7MPa, and the reaction time ...
Embodiment 3
[0019] Such as figure 1 As shown, first mix the non-metallic powder of the waste circuit board with 2mol / L dilute hydrochloric acid at a solid-to-liquid ratio of 1:25g / mL, and perform heating pretreatment at 90°C. The purpose of the pretreatment is to remove the non-metallic powder of the waste circuit board Residual metal elements in the solution were pretreated for a certain period of time for 5 hours, filtered, and the precipitate was washed and dried. The non-metallic powder of waste circuit board after hydrochloric acid pretreatment was subjected to subcritical water oxidation activation. The subcritical water oxidation activation process can achieve two goals: one is to decompose and remove the organic materials containing brominated flame retardants, and the other is to activate and prepare porous silica. The specific process of subcritical water oxidation activation is as follows: control the temperature of the subcritical water oxidation reactor to 350°C, the pressur...
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