Method for removing arsenic, antimony and bismuth from copper electrolyte

A copper electrolyte and electrolyte technology, applied in the field of bismuth, removing arsenic and antimony from copper electrolyte, can solve the problems of low activity of purifying agent, poor impurity removal effect, etc., and achieve the effect of high-efficiency impurity removal ability

Active Publication Date: 2016-11-09
JIANGXI UNIV OF SCI & TECH +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The purpose of the present invention is to provide a method for removing arsenic, antimony and bismuth from copper electrolyte without loss of copper and nickel, which can avoid the dissolution loss, solution residue and floating formation of purifying agents...

Method used

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  • Method for removing arsenic, antimony and bismuth from copper electrolyte

Examples

Experimental program
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Effect test

Embodiment 1

[0022] Mix 150g of titanium dioxide with 12mol / L potassium hydroxide solution, stir and react at 200°C for 3 hours, filter and wash the obtained filter residue with water, which is the active impurity remover, and put the impurity remover into 8L copper electrolytic solution A1 (sulfuric acid concentration 297g / L, containing arsenic 9g / L, antimony 0.1g / L, bismuth 5.1g / L, copper 21g / L, nickel 2.2g / L), after stirring and reacting at 120°C for 4 hours, liquid-solid separation to obtain arsenic-antimony Bismuth mixed slag B1-1 and purified liquid. Through this step, the removal rates of arsenic, antimony and bismuth in the miscellaneous copper-containing electrolytic solution are 91.7%, 27% and 83.6% respectively, and the titanium content in the purified solution is lower than 0.1g / L. The content of copper and nickel in the arsenic-antimony-bismuth mixed slag B1-1 is below 0.2wt.%.

[0023] Mix the above-mentioned arsenic-antimony-bismuth mixed slag B1-1 with 8mol / L sodium hydrox...

Embodiment 2

[0028] Mix 200g of zirconium dioxide with 12mol / L sodium hydroxide solution, stir and react at 130°C for 6 hours, filter and wash the obtained filter residue with water, which is the active impurity remover, and put the impurity remover into 8L copper electrolyte A2 ( Sulfuric acid concentration 51g / L, arsenic 26g / L, antimony 4.9g / L, bismuth 2.5g / L, copper 51g / L, nickel 8.6g / L), after stirring and reacting at 80°C for 2 hours, the liquid and solid were separated to obtain Arsenic-antimony-bismuth mixed slag B2-1 and purified liquid. Through this step, the removal rates of arsenic, antimony and bismuth in the copper-containing electrolytic solution are 82.1%, 87.6% and 80% respectively, and the zirconium content in the purified solution is lower than 0.1g / L. The content of copper and nickel in the arsenic-antimony-bismuth mixed slag B2-1 is below 0.2wt.%.

[0029] Mix the above-mentioned arsenic-antimony-bismuth mixed slag B2-1 with 5mol / L sodium hydroxide solution, stir and r...

Embodiment 3

[0034] Mix 18g of metatitanic acid with 7mol / L potassium hydroxide solution, stir and react at 50°C for 6 hours, filter and wash the obtained filter residue, which is an active impurity remover, and put this impurity remover into 2L copper electrolytic solution A3 ( Sulfuric acid concentration 153g / L, arsenic 1.1g / L, antimony 2.6g / L, bismuth 0.1g / L, copper 36g / L, nickel 9.7g / L), after stirring at 40°C for 0.5 hours, liquid-solid separation The arsenic-antimony-bismuth mixed slag B3-1 and the purified liquid were obtained. Through this step, the removal rates of arsenic, antimony and bismuth in the copper-containing electrolytic solution are 45.1%, 86.9% and 22% respectively, and the titanium content in the purified solution is lower than 0.1g / L. The content of copper and nickel in the arsenic-antimony-bismuth mixed slag B3-1 is below 0.2wt.%.

[0035] Mix the above-mentioned arsenic-antimony-bismuth mixed slag B3-1 with 7mol / L sodium hydroxide solution, stir and react at 120°...

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Abstract

The invention discloses a method for removing arsenic, antimony and bismuth from a copper electrolyte. The method is characterized in that a titanium or zirconium compound is converted into titanate or zirconate which is insoluble in water, has activity and is adopted as an active impurity removing agent through a hot alkali activation manner, the active impurity removing agent is utilized to react with acid in the copper electrolyte to generate a hydrous oxide in situ, and impurities like arsenic, antimony and bismuth are precipitated and removed. According to the method, the arsenic, antimony and bismuth in the copper electrolyte are efficiently removed under the precondition of no copper and nickel loss, solution loss of titanium or zirconium is remarkably reduced, generation of floating objects is avoided, and the active impurity removing agent can be circularly utilized.

Description

technical field [0001] The invention relates to a solution purification and impurity removal method, in particular to a method for removing arsenic, antimony and bismuth from copper electrolyte. Background technique [0002] Arsenic, antimony and bismuth are common associated elements of copper minerals. Because its potential is similar to that of copper, it can be discharged and precipitated at the cathode, and it is easy to form floating anode slime to adhere to the cathode, making it the most harmful impurity element to the quality of electrical copper. In order to avoid the harm of the above-mentioned impurities, on the one hand, it should be removed as much as possible in copper pyrometallurgy; on the other hand, it is necessary to strengthen the purification and filtration of copper electrolyte to maintain a low concentration of arsenic, antimony, and bismuth in the electrolyte. At present, copper smelting enterprises widely adopt the electrowinning method to co-preci...

Claims

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Application Information

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IPC IPC(8): C25C1/12C22B30/02C22B30/06C22B3/44
CPCC22B3/44C22B30/02C22B30/06C25C1/12Y02P10/20
Inventor 徐志峰李俊标曹才放杨利群杨亮苏峰王放周忠
Owner JIANGXI UNIV OF SCI & TECH
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