A photographic manufacturing method for day and night reticle elements

A manufacturing method and component technology, applied in optical components, optics, instruments, etc., can solve the problems of low reticle accuracy, poor reticle quality, low processing efficiency, etc., and achieve high line width accuracy and position accuracy, The effect of good part consistency and high mass production efficiency

Active Publication Date: 2018-06-19
河南平原光电有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Overcome the problems of poor quality of reticle lines, low reticle accuracy and low processing efficiency in the manufacture of day and night reticle elements by mechanical scale method

Method used

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  • A photographic manufacturing method for day and night reticle elements

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Effect test

Embodiment 1

[0033] φ50mm parts, requirements: line width 0.02mm±0.005mm, position accuracy 0.003mm, surface defect grade B=Ⅰ-20. Check the environmental parameters before starting work. The temperature is 24°C, the relative humidity is 53%, and the cleanliness is grade 6. Check the defect level of the photo blank surface B=Ⅰ-20, clamp the part to the centrifugal coating machine, control the speed at 3000r / min, evenly coat the BN303 negative photoresist on the photo blank surface, and dry it; inspection The accuracy of the photographic master plate meets the requirements. Contact the photographic master plate with the side coated with the adhesive layer downward, and expose it with an exposure machine for 150s; after development, rinsing, inspection, and drying, apply protective wax on the side of the part; Prepare glass corrosion solution with 25% hydrofluoric acid, 35% sulfuric acid and 40% phosphoric acid, immerse the parts in the glass corrosion solution for 15 seconds, rinse with clea...

Embodiment 2

[0035] φ20mm parts, requirements: line width 0.008mm±0.001mm, position accuracy 0.002mm, surface defect level B=Ⅰ-20. Check the environmental parameters before starting work. The temperature is 23°C, the relative humidity is 48%, and the cleanliness is grade 6. Check the defect level B= Ⅰ-20 on the surface of the photo blank, clamp the part to the centrifugal coating machine, control the speed at 4000r / min, evenly coat the BN303 negative photoresist on the surface of the photo blank, and dry it; inspection The accuracy of the photographic master plate meets the requirements. Contact the photographic master plate with the side coated with the adhesive layer downward, and use an exposure machine to expose the exposure time for 120s; after developing, rinsing, checking, and drying, apply protective wax on the side of the part; Prepare glass corrosion solution with 20% hydrofluoric acid, 40% sulfuric acid and 40% phosphoric acid, immerse the parts in the glass corrosion solution f...

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Abstract

The invention discloses a method for photographic production of day and night reticle elements. The steps of the method are as follows: S1. After the light blank is manufactured to pass, use a centrifugal gluing machine with adjustable rotation speed, and control the rotation speed to 3000r / min-4000r / min. min, apply BN303 negative photoresist evenly on the surface of the photobase, and dry it before drying; S2, check that the accuracy of the photo master meets the requirements, and carry out contact exposure with the side coated with the adhesive layer facing down to the photo master, and the exposure time is 120s ~150s; S3, after development, rinsing, inspection, and post-drying, apply protective wax on the side of the part; S4, according to the ratio of 20% to 25% of hydrofluoric acid, 35% to 40% of sulfuric acid, and 40% of phosphoric acid Prepare glass corrosion solution; S5. Immerse the parts in the glass corrosion solution for 8s~15s, rinse with clean water immediately after taking it out, and check the reticle pattern and surface defect level after stripping, coloring and polishing.

Description

technical field [0001] The invention belongs to the technical field of preparation of optical equipment components, and in particular relates to a photographic production method of day and night dual-purpose reticle components. Background technique [0002] In order to meet the requirements of aiming and measuring in optical instruments, reticle elements are required. The reticle elements can be divided into two categories according to the purpose: ordinary reticle elements and day and night dual use reticle elements. Ordinary reticle elements generally form a reticle pattern by plating metal chromium on the glass surface, which are mainly used during the day; day and night dual use The reticle element needs to corrode corresponding grooves on the glass surface, and fill the grooves with luminous materials such as zinc oxide to form a reticle pattern, which can be used day and night. In comparison, the day and night reticle element has a long processing cycle and is difficu...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02B27/32
CPCG02B27/32
Inventor 张成群陈俊霞任玉河苏颖陈菊意龚涛程萍田军刘海伟张勇白涛
Owner 河南平原光电有限公司
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