Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Microphone monomer capable of suppressing resonance oscillation

A microphone and monomer technology, applied in the direction of transducer circuits, sensors, electrical components, etc., can solve problems such as inability to complete frequency response and increase noise

Pending Publication Date: 2016-11-23
ZILLTEK TECH SHANGHAI +1
View PDF10 Cites 2 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0002] Microphones have certain requirements for frequency response in practical applications. For example, high frequency needs to be suppressed, a certain frequency signal needs to be eliminated, and wind noise, car noise or 50HZ power frequency noise needs to be suppressed. In the prior art, the microphone is mainly composed of The IC (integrated circuit) integrated on the PCB board and the amplifier and buffer packaged in a box shape are composed of an IC (integrated circuit) packaged in a box shape, packaged in a metal shell and installed on the PCB board to play the role of radio frequency shielding, and cannot meet the requirements for frequency response
[0003] Since the sensor is placed in the metal shell, a Holmes resonance point will be generated, which will make the frequency response upward. In addition, the low-frequency car noise, wind dryness or 50HZ power frequency noise and the noise generated when the speaker is close to the microphone warn that the microphone is amplified. Pass to horn again, form a circuit, greatly increased noise, therefore, how to suppress generation above-mentioned phenomenon becomes the big difficult problem that those skilled in the art face

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Microphone monomer capable of suppressing resonance oscillation
  • Microphone monomer capable of suppressing resonance oscillation
  • Microphone monomer capable of suppressing resonance oscillation

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0037] The present invention will be further described below in conjunction with the accompanying drawings and specific embodiments, but not as a limitation of the present invention.

[0038] see figure 1 The structure shown in the traditional method is a structural diagram of the internal components of the microphone, which specifically includes an inductor 1, a bias circuit 2, an amplifier 3, a buffer 4 and a filter 5, wherein the bias circuit converts the voltage input from the voltage input terminal VDD into Bias voltage, the inductor 1 can be a capacitive sensor, the bias voltage signal provided by the bias circuit is transmitted to the amplifier 3 through the inductor 1, the sensing signal amplified by the amplifier passes through the buffer 4 and finally passes through the filter 5 Filter out some clutter and output.

[0039] See attached figure 2 The structure shown in the embodiment of the present invention is a schematic diagram of the structure of the internal de...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to the technical field of electronic equipment, in particular to a microphone monomer capable of suppressing resonance oscillation. The microphone monomer comprising a voltage input end, an inductor, a biasing circuit, an amplifier, an equalizer, a buffer and a filter is established, wherein the equalizer is arranged between the amplifier and the buffer. With the adoption of the technical scheme, the microphone monomer has the benefits that the requirements of a microphone for frequency response are met, the effect that the high frequency is suppressed is achieved, the frequency required to be eliminated is eliminated, an audio signal achieves an expected effect through being adjusted by the equalizer, and the quality after audio signal transmission is effectively improved.

Description

technical field [0001] The invention relates to the technical field of electronic equipment, in particular to a microphone monomer for suppressing resonance. Background technique [0002] Microphones have certain requirements for frequency response in practical applications. For example, high frequency needs to be suppressed, a certain frequency signal needs to be eliminated, and wind noise, car noise or 50HZ power frequency noise needs to be suppressed. In the prior art, the microphone is mainly composed of The IC (integrated circuit) integrated on the PCB is composed of an amplifier and a buffer packaged in a box shape. The package is packaged in a metal shell and installed on the PCB to play the role of radio frequency shielding, which cannot meet the requirements for frequency response. [0003] Since the sensor is placed in the metal shell, a Holmes resonance point will be generated, which will make the frequency response upward. In addition, the low-frequency car noise...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): H04R3/00
Inventor 叶菁华
Owner ZILLTEK TECH SHANGHAI
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com