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Surface shape correcting method for silicic acid yttrium-lutetium crystal

A technology of yttrium lutetium silicate and crystal, which is applied in the field of positron emission tomography to achieve the effect of meeting the precision requirements

Active Publication Date: 2016-12-07
成都精密光学工程研究中心
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

At present, there is no mature process for obtaining YLSO with high-precision surface shape and ultra-smooth surface

Method used

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  • Surface shape correcting method for silicic acid yttrium-lutetium crystal
  • Surface shape correcting method for silicic acid yttrium-lutetium crystal
  • Surface shape correcting method for silicic acid yttrium-lutetium crystal

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Experimental program
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Effect test

Embodiment 1

[0045] 1. Test conditions

[0046] Grinding equipment: ultra-precision active drive grinding machine

[0047] Grinding disc diameter: 300mm

[0048] Yttrium lutetium silicate crystal size: 4mm×4mm×20mm

[0049] Glass backplane size: diameter 50mm

[0050] Pressure: 2~4kPa

[0051] Grinding disc, polishing disc speed: 15 ~ 20rpm

[0052] Rotational speed of yttrium lutetium silicate crystal: 15~20rpm

[0053] 2. Testing equipment

[0054] Roughness: Zygo optical roughness testing equipment

[0055] Surface shape: QED optical interferometer

[0056] Appearance: Keyence optical digital microscope

[0057] Particle size: Malvern laser scattering particle size tester

[0058] Grinding method: The abrasive is continuously transported to the synthetic tin plate, so that the ground surface of the yttrium lutetium silicate crystal is in free contact with the synthetic tin plate, and the ground surface and the synthetic tin plate are in relative motion, and the abrasive is cont...

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Abstract

The invention provides a surface shape correcting method for a silicic acid yttrium-lutetium crystal. The surface shape correcting method for the silicic acid yttrium-lutetium crystal comprises the following steps that the silicic acid yttrium-lutetium crystal is ground N times by means of abrasive materials correspondingly, and then polishing is conducted by means of polishing materials, wherein N is a positive integer which is equal to or greater than two. The abrasive materials contain corundum with the particle size being 5-80 [mu]m, and the particle size of the corundum in the abrasive materials used in the N grinding process is smaller than the particle size of the corundum in the abrasive material used in the N+1 grinding process. The polishing materials contain ceric oxide with the particle size being 1-3 micrometers. By the adoption of the machining method provided by the invention, the surface shape precision of the surface of the silicic acid yttrium-lutetium crystal can be kept 100 nm or below, the surface roughness is lower than 0.5 nm, and the requirement of a positron emission computed tomography device for the silicic acid yttrium-lutetium crystal can be met.

Description

technical field [0001] The invention relates to the field of positron emission computed tomography, in particular to an ultra-smooth and high-precision surface modification method for yttrium-lutetium silicate crystals. Background technique [0002] Positron Emission Tomography (PET) is a research and application hotspot in recent years. Its wide application in the medical field has gradually emerged, and it has become an important means of diagnosing cancer, heart disease and brain diseases. . Compared with other diagnostic methods, such as nuclear magnetic resonance (MRI) or computed tomography (CT), PET can diagnose earlier cancers and distinguish benign and malignant tumors, and can also be effectively used to guide the treatment of tumors. [0003] A central component used in PET technology is the scanner, which detects trace amounts of radioactive elements injected into the human body. The positrons released by the radioactive elements annihilate with the electrons i...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B24B1/00C09K3/14C09G1/02
CPCB24B1/00C09G1/02C09K3/1409
Inventor 李亚国袁志刚许剑锋孙权权王健许乔徐曦
Owner 成都精密光学工程研究中心
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