Method for manufacturing microbridge of uncooled infrared focal plane detector and structure thereof
A focal plane detector, uncooled infrared technology, applied in the direction of electric radiation detectors, etc., can solve the problems of not too much contribution, no signal response, contribution, etc., to reduce the proportion of invalid absorption, improve absorption efficiency, and improve absorption The effect of proportion
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[0053] The principles and features of the present invention are described below in conjunction with the accompanying drawings, and the examples given are only used to explain the present invention, and are not intended to limit the scope of the present invention.
[0054] An embodiment of the present invention provides a method for making an uncooled infrared focal plane detector microbridge, see Figure 1 to Figure 8 , its specific process steps are as follows:
[0055] Such as figure 1 As shown, the reflective layer 2 is made on the wafer with the readout circuit 1 as the base, the material used for the reflective layer 2 is metal, and the thickness of the metal film is The reflection rate of reflective layer 2 metal to infrared light of specific wavelength (such as 8 ~ 14um) is more than 99%. After etching the reflective layer 2, an insulating dielectric layer 3 is deposited on the pattern of the reflective layer 2. The insulating dielectric layer 3 can be made of Si 3 N...
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