Ingan/gan nanocolumn multiple quantum wells grown on strontium aluminate tantalum lanthanum substrate and preparation method thereof
A technology of strontium tantalum lanthanum aluminate and multiple quantum wells, which is applied to semiconductor devices, electrical components, circuits, etc., can solve problems such as unstable chemical properties, achieve the effects of easy acquisition, increase growth rate and productivity, and reduce production costs
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Embodiment 1
[0041] The preparation method of the InGaN / GaN nanocolumn multiple quantum well grown on the strontium tantalum lanthanum aluminate substrate of this embodiment comprises the following steps:
[0042] (1) Selection of the substrate and its crystal orientation: using La 0.3 Sr 1.7 AlTaO 6 The substrate, with the (111) plane offset from the (100) direction by 0.5-1° as the epitaxial plane, the crystal epitaxial orientation relationship is: the (0001) plane of GaN is parallel to the La 0.3 Sr 1.7 AlTaO 6 (111) side;
[0043] (2) Substrate surface polishing, cleaning and annealing treatment, the specific process of the annealing is: put the substrate into the annealing chamber, and treat La 0.3 Sr 1.7 AlTaO 6 The substrate was annealed for 3 hours and then air-cooled to room temperature;
[0044] The surface polishing of the substrate is specifically: firstly La 0.3 Sr 1.7 AlTaO 6 The surface of the substrate is polished with diamond slurry, and the surface of the subst...
Embodiment 2
[0055] The preparation method of the nanocolumn LED grown on the strontium tantalum lanthanum aluminate substrate of this embodiment comprises the following steps:
[0056] (1) Selection of the substrate and its crystal orientation: using La 0.3 Sr 1.7 AlTaO 6 The substrate, with the (111) plane offset from the (100) direction by 0.5-1° as the epitaxial plane, the crystal epitaxial orientation relationship is: the (0001) plane of GaN is parallel to the La 0.3 Sr 1.7 AlTaO 6 (111) side;
[0057] (2) Substrate surface polishing, cleaning and annealing treatment, the specific process of the annealing is: put the substrate into the annealing chamber, and treat La 0.3 Sr 1.7 AlTaO 6 The substrate was annealed for 5 hours and then air-cooled to room temperature;
[0058]The surface polishing of the substrate is specifically:
[0059] La 0.3 Sr 1.7 AlTaO 6 The surface of the substrate is polished with diamond slurry, and the surface of the substrate is observed with an op...
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