Nonpolar ingan/gan multi-quantum well nanocolumn and its preparation method
A multi-quantum well, non-polar technology, applied in the direction of nanotechnology, semiconductor/solid-state device manufacturing, semiconductor devices, etc., can solve the problems of LED light-emitting wavelength instability, reduced carrier radiation recombination efficiency, LED bending, etc., to achieve Reduce the QCSE effect, improve the radiation recombination efficiency, and reduce the effect of thermal stress
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Embodiment 1
[0048] This example was grown on LiGaO 2 The preparation method of the nonpolar InGaN / GaN multi-quantum well nanocolumn on the substrate comprises the following steps:
[0049] (1) Using LiGaO 2 For the substrate, select the crystal orientation as the epitaxial plane with the (100) plane offset by 0.5° to the (110) direction;
[0050] (2) Carry out surface polishing, cleaning and annealing treatment to substrate, the concrete process of described substrate surface polishing is: first LiGaO 2 The surface of the substrate is polished with diamond slurry, and the surface of the substrate is observed with an optical microscope until there are no scratches, and then the method of chemical mechanical polishing is used for polishing; the specific process of cleaning is: the LiGaO 2 The substrate was ultrasonically cleaned in deionized water for 3 minutes at room temperature to remove LiGaO 2 Contamination particles on the surface of the substrate are washed with hydrochloric acid,...
Embodiment 2
[0063] This example was grown on LiGaO 2 The preparation method of the nonpolar InGaN / GaN multi-quantum well nanocolumn on the substrate comprises the following steps:
[0064] (1) Using LiGaO 2 For the substrate, select the epitaxial plane with the crystal orientation as the (100) plane offset by 1.0° to the (110) direction;
[0065] (2) Carry out surface polishing, cleaning and annealing treatment to substrate, the concrete process of described substrate surface polishing is: first LiGaO 2 The surface of the substrate is polished with diamond slurry, and the surface of the substrate is observed with an optical microscope until there are no scratches, and then the method of chemical mechanical polishing is used for polishing; the specific process of cleaning is: the LiGaO 2 The substrate was ultrasonically cleaned in deionized water for 5 minutes at room temperature to remove LiGaO 2 Contamination particles on the surface of the substrate are washed with hydrochloric acid,...
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