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Memory cell, semiconductor structure, semiconductor device and manufacturing method

A technology of memory cells and magnetic cells, applied in the manufacture/processing of semiconductor devices, electromagnetic devices, electrical components, etc., can solve problems such as microstructure defects

Active Publication Date: 2019-05-28
MICRON TECH INC
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  • Abstract
  • Description
  • Claims
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Problems solved by technology

However, propagating the crystal structure can be inhibited or can lead to microstructural defects in the target magnetic material: in the case where the seed material has defects in its crystal structure, in the case where the target magnetic material has a Structurally antagonized crystal structures, or in the case where an antagonistic crystal structure also propagates from materials other than the seed material to the target magnetic material
Therefore, forming a magnetic material with a desired microstructure (e.g., achieving high TMR) without degrading other properties of the magnetic material or the resulting structure (e.g., MA strength) can present challenges

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  • Memory cell, semiconductor structure, semiconductor device and manufacturing method
  • Memory cell, semiconductor structure, semiconductor device and manufacturing method
  • Memory cell, semiconductor structure, semiconductor device and manufacturing method

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Embodiment Construction

[0047] The present invention discloses memory cells, semiconductor structures, semiconductor devices, memory systems, electronic systems, methods of forming memory cells, and methods of forming semiconductor structures. During fabrication of the memory cell, the "diffusion species" is at least partially removed from the magnetic material (which may also be characterized as "precursor magnetic material") due to the proximity of the precursor magnetic material to containing at least one attractor A "precursor trapping material" for a substance. The at least one attractor species has at least one trapping site and has a higher chemical affinity for the diffusive species than the chemical affinity between the diffusive species and other species in the precursor magnetic material. affinity. The diffusing species can diffuse from the precursor magnetic material to the precursor trapping material. Therein, the diffused species can bond with the attractor species at the trapping sit...

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Abstract

A magnetic cell includes a magnetic region formed from a precursor magnetic material including a diffused species and at least one other species. an amorphous region proximate to the magnetic region and formed of a precursor trapping material comprising at least one attractor species having at least one trapping site and a chemical affinity for the diffusing species . The diffusing species is transferred from the precursor magnetic material to the precursor trapping material, wherein the diffusing species is bonded to the at least one attractor species at the trapping sites. The species of the enriched trapping material may be intermixed such that the enriched trapping material becomes or remains amorphous. The depleted magnetic material can then be crystallized by propagation from adjacent crystalline material without interference from the amorphous enriched trapping material. This achieves high tunnel magnetoresistance and high magnetic anisotropy strength. The invention also discloses a manufacturing method and a semiconductor device.

Description

[0001] priority claim [0002] This application claims that the serial number of the application titled "MEMORY CELLS, SEMICONDUCTOR STRUCTURES, SEMICONDUCTOR DEVICES, AND METHODS OF FABRICATION" filed on April 9, 2014 is 14 / 249,183 Interest in the filing date of the U.S. patent application. technical field [0003] In various embodiments, the present invention relates generally to the field of memory device design and fabrication. More particularly, the present invention relates to the design and fabrication of memory cells characterized as spin torque transfer magnetic random access memory (STT-MRAM) cells, to the semiconductor structures employed in such memory cells, and to the incorporation of Semiconductor devices of such memory cells. Background technique [0004] Magnetic Random Access Memory (MRAM) is a non-volatile computer memory technology based on magnetoresistance. One type of MRAM cell is a spin torque transfer MRAM (STT-MRAM) cell that includes a magnetic...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L43/10H01L43/02H01L43/12H10N50/10H10N50/01H10N50/80
CPCH10N50/01H10N50/10H10N50/85H10N50/80H10B61/00
Inventor 古尔特杰·S·桑胡苏密特·C·潘迪
Owner MICRON TECH INC