Flexible AMOLED display device preparation method

A manufacturing method and display technology, which are applied in semiconductor/solid-state device manufacturing, electric solid-state devices, semiconductor devices, etc., can solve problems such as protrusions and depressions of the flexible substrate 200, cleaning, damage to the flexible substrate 200, etc., and achieve improved resistance. Water and oxygen barrier properties, high level of flatness, the effect of ensuring optical performance

Active Publication Date: 2017-02-22
WUHAN CHINA STAR OPTOELECTRONICS TECH CO LTD
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Problems solved by technology

[0010] In the above method for manufacturing a flexible AMOLED display, since the initial Clean in the step 1' cannot completely clean the impurity particles (Particles) on the glass substrate 100, the surface of the glass substrate 100 is rough, so in such a The flexible substrate 200 formed on the glass substrate 100 is prone to poor protrusions and depressions; and, in the case of the rough surface of the glass substrate 100, the flexible substrate 200 is easily combined with the glass substrate 100 tightly, resulting in the The laser lift-off process in step 4' cannot completely peel off the flexible substrate 200 from the glass substrate 100, resulti

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Embodiment Construction

[0038] In order to further illustrate the technical means adopted by the present invention and its effects, the following describes in detail in conjunction with preferred embodiments of the present invention and accompanying drawings.

[0039] see Figure 5 , the invention provides a method for manufacturing a flexible AMOLED display, comprising the steps of:

[0040] Step 1, such as Image 6 As shown, a rigid substrate 10 is provided, and the rigid substrate 10 is cleaned (initialClean).

[0041] Specifically, in the step 1, the rigid substrate 10 is a glass substrate.

[0042] Step 2, such as Figure 7 As shown, an inorganic film layer 20 with a flat surface is formed on the rigid substrate 10 .

[0043] Specifically, in the step 2, the inorganic film layer 20 is formed by using plasma enhanced chemical vapor deposition (PECVD, PlasmaEnhanced Chemical Vapor Deposition).

[0044] The inorganic film layer 20 can improve the planarization degree of the surface of the rigid ...

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Abstract

The invention provides a flexible AMOLED display device preparation method, before preparing a flexible substrate on a rigid substrate, firstly forming an inorganic substance film layer with flat surface, then coating a polymer material on the inorganic substance film layer, and forming the flexible substrate, the method not only can avoid the issue of bad pits and bulges on the flexible substrate caused by residual impurities from poor rinsing of the rigid substrate surface, but also can make the flexible substrate and the rigid substrate to easily be separated in the peeling process of the flexible substrate and the rigid substrate, protects the flexible substrate from being damaged, thereby enabling the prepared flexible substrate of the flexible AMOLED display device to have relatively high degree of evenness, the method increases the water resistance and oxygen resistance performance of the flexible substrate, and guarantees the optical performance of the flexible AMOLED display device.

Description

technical field [0001] The invention relates to the field of display technology, in particular to a method for manufacturing a flexible AMOLED display. Background technique [0002] Organic Light-Emitting Diode (OLED) display, also known as organic electroluminescent display, is an emerging flat panel display device, due to its simple preparation process, low cost, low power consumption, high luminance, Wide range of working temperature, light and thin size, fast response speed, easy to realize color display and large-screen display, easy to realize matching with integrated circuit driver, easy to realize flexible display, etc., so it has broad application prospects. [0003] According to the driving method, OLED can be divided into two categories: passive matrix OLED (Passive Matrix OLED, PMOLED) and active matrix OLED (Active Matrix OLED, AMOLED), namely direct addressing and thin film transistor (TFT, Thin Film Transistor) There are two types of matrix addressing. Among...

Claims

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Application Information

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IPC IPC(8): H01L27/32H01L51/56H01L51/52
CPCH10K59/12H10K50/80H10K59/1201H10K71/00
Inventor 李朝邱立峯
Owner WUHAN CHINA STAR OPTOELECTRONICS TECH CO LTD
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